SCHEMBL2547572

SCHEMBL2547572

[CH]=Cc1cccc(C#N)c1C#N

nearest known ligand 0.37

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
SMN1; SMN2 Q16637 3/20 0.37
HIF1A Q16665 1/20 0.37
TSHR P16473 1/20 0.35
HTT P42858 1/20 0.35
CA1 P00915 1/20 0.33
CA2 P00918 1/20 0.33
MAOA P21397 1/20 0.33
MAOB P27338 1/20 0.33
ALDH1A1 P00352 4/20 0.32
MAPT P10636 3/20 0.32
KDM4E B2RXH2 4/20 0.32
LMNA P02545 1/20 0.32
MCL1 Q07820 1/20 0.31
GAA P10253 3/20 0.31
POLB P06746 1/20 0.31
MEN1 O00255 1/20 0.30
CACNA1B Q00975 1/20 0.30
APBA1 Q02410 1/20 0.30
KMT2A Q03164 1/20 0.30
PNMT P11086 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL332685 0.81 AR (0.31) AR
SCHEMBL1674721 0.80 TSHR (0.44) SMN1; SMN2TSHRHTTCA1CA2
SCHEMBL3023051 0.79 MEN1 (0.42) SMN1; SMN2HIF1ATSHRHTTCA1
SCHEMBL16953581 0.79 SMN1; SMN2 (0.37) SMN1; SMN2HIF1ATSHRHTTCA1
SCHEMBL60842 0.79 SMN1; SMN2 (0.37) SMN1; SMN2HIF1ATSHRHTTCA1
SCHEMBL31255957 0.78 TSHR (0.39) SMN1; SMN2HIF1ATSHRHTTCA1
SCHEMBL645262 0.77 TSHR (0.48) SMN1; SMN2HIF1ATSHRHTTCA1
SCHEMBL1932226 0.73 ALDH1A1 (0.44) SMN1; SMN2HIF1AMAOAMAOBALDH1A1
Benzene SCHEMBL29106073 0.73 ALDH1A1 (0.44) SMN1; SMN2HIF1AMAOAMAOBALDH1A1
SCHEMBL1722260 0.73 ALDH1A1 (0.44) SMN1; SMN2HIF1AMAOAMAOBALDH1A1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 67 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11977331-B2 Composition containing a dicyanostyryl group, for forming a resist underlayer film capable of being wet etched NISSAN CHEMICAL CORPORATION (JP) 2024-05-07 US claimed
US-20220397828-A1 COMPOSITION CONTAINING A DICYANOSTYRYL GROUP, FOR FORMING A RESIST UNDERLAYER FILM CAPABLE OF BEING WET ETCHED NISSAN CHEMICAL CORPORATION (JP) 2022-12-15 US claimed
CN-113994263-A Wet-etchable resist underlayer film forming composition containing dicyanostyryl group 日产化学株式会社 2022-01-28 CN claimed
CN-113994261-A Wet-etchable resist underlayer film forming composition containing heterocyclic compound having dicyanostyryl group 日产化学株式会社 2022-01-28 CN claimed
EP-2553025-B1 COLORED COMPOSITION, INKJET INK, COLOR FILTER AND METHOD OF PRODUCING THE SAME, SOLID-STATE IMAGE SENSOR AND DISPLAY DEVICE FUJIFILM CORP (JP) 2022-01-12 EP claimed
WO-2020255984-A1 COMPOSITION FOR FORMING RESIST UNDERLAYER FILM CAPABLE OF WET ETCHING, CONTAINING HETEROCYCLIC COMPOUND HAVING DICYANOSTYRYL GROUP 日産化学株式会社 2020-12-24 WO claimed
US-9389347-B2 Colored composition, inkjet ink, color filter and method of producing the same, solid-state image sensor and display device FUJIFILM CORPORATION (JP) 2016-07-12 US claimed
US-6692879-B2 Thermal transfer image-receiving sheet which can yield images with high dyeability, is free from heat fusing to a thermal transfer sheet at the time of image formation, and has satisfactory separability from the thermal transfer sheet DAI NIPPON PRINTING CO., LTD. (JP) 2004-02-17 US claimed
US-20030203293-A1 Thermal transfer recording material DAI NIPPON PRINTING CO., LTD. (JP) 2003-10-30 US claimed
EP-1275518-A1 THERMAL TRANSFER RECORDING MATERIAL DAI NIPPON PRINTING CO., LTD. (JP) 2003-01-15 EP claimed
US-5592208-A Printing method and a printing apparatus for carrying out the same SONY CORPORATION (JP) 1997-01-07 US claimed
US-20240219834-A1 METHOD FOR FORMING A RESIST PATTERN NISSAN CHEMICAL CORPORATION (JP) 2024-07-04 US disclosed
US-11977331-B2 Composition containing a dicyanostyryl group, for forming a resist underlayer film capable of being wet etched NISSAN CHEMICAL CORPORATION (JP) 2024-05-07 US disclosed
US-11977331-B2 Composition containing a dicyanostyryl group, for forming a resist underlayer film capable of being wet etched NISSAN CHEMICAL CORPORATION (JP) 2024-05-07 US disclosed
US-11977331-B2 Composition containing a dicyanostyryl group, for forming a resist underlayer film capable of being wet etched NISSAN CHEMICAL CORPORATION (JP) 2024-05-07 US disclosed
US-5568170-A Laser recording apparatus for vaporizing colder dye across a gap, and recording method thereof SONY CORPORATION (JP) 1996-10-22 US disclosed
EP-0633296-A1 Novel dyestuffs and their use MITSUI TOATSU CHEMICALS, Inc. (JP) 1995-01-11 EP disclosed
EP-0628426-A1 Recording apparatus and recording method SONY CORPORATION (JP) 1994-12-14 EP disclosed
EP-0608881-A2 Printing method and a printing apparatus for carrying out the same SONY CORPORATION (JP) 1994-08-03 EP disclosed
EP-0064303-A1 Mixtures of biscyanostyryl benzenes BASF Aktiengesellschaft (DE) 1982-11-10 EP disclosed