Allylamine

Allylamine

SCHEMBL2547892

C=C(C)C(=O)OCC.C=CCN

nearest known ligand 0.50

Full drug profile on Sugi Atlas →

Predicted protein targets (top 17)

geneUniProtsupporting neighboursconfidence
THRB P10828 1/20 0.50
TSHR P16473 4/20 0.44
GLO1 Q04760 1/20 0.44
ALDH1A1 P00352 9/20 0.42
NPSR1 Q6W5P4 1/20 0.39
LMNA P02545 1/20 0.39
HSD17B10 Q99714 1/20 0.39
ALOX15 P16050 1/20 0.38
MGAM O43451 1/20 0.38
GAA P10253 1/20 0.38
SI P14410 1/20 0.38
MGAM2 Q2M2H8 1/20 0.38
MAPT P10636 2/20 0.36
CYP2D6 P10635 2/20 0.36
CYP2C19 P33261 1/20 0.36
CYP1A2 P05177 1/20 0.35
SMN1; SMN2 Q16637 1/20 0.35

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL5831741 0.90 THRB (0.55) THRBTSHRGLO1ALDH1A1NPSR1
SCHEMBL4713738 0.88 THRB (0.53) THRBTSHRGLO1ALDH1A1NPSR1
Ethylamine SCHEMBL4364175 0.87 THRB (0.57) THRBTSHRGLO1ALDH1A1NPSR1
SCHEMBL27798356 0.85 THRB (0.55) THRBTSHRGLO1ALDH1A1NPSR1
Propene SCHEMBL20853733 0.85 THRB (0.55) THRBTSHRGLO1ALDH1A1NPSR1
Butadiene SCHEMBL2354922 0.85 THRB (0.55) THRBTSHRGLO1ALDH1A1NPSR1
Ethylenediamine SCHEMBL4650024 0.85 THRB (0.61) THRBTSHRGLO1ALDH1A1NPSR1
SCHEMBL5576923 0.85 THRB (0.55) THRBTSHRGLO1ALDH1A1NPSR1
Hydroxyamine SCHEMBL29435122 0.85 THRB (0.59) THRBTSHRGLO1ALDH1A1NPSR1
Methylamine SCHEMBL202768 0.85 THRB (0.59) THRBTSHRGLO1ALDH1A1NPSR1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 53 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-2346474-B1 POWDERY STYLING COMPOSITIONS HENKEL AG & CO KGAA (DE) 2013-05-22 EP claimed
CN-110073470-B Adhesive tape for semiconductor processing 古河电气工业株式会社 2023-10-17 CN disclosed
CN-109075055-B Adhesive tape for protecting surface of semiconductor wafer and method for processing semiconductor wafer 古河电气工业株式会社 2023-08-15 CN disclosed
CN-112368108-B Adhesive tape for glass processing 古河电气工业株式会社 2022-11-04 CN disclosed
CN-112368106-B Adhesive tape for glass processing 古河电气工业株式会社 2022-11-01 CN disclosed
CN-111742026-B Ultraviolet-curable adhesive tape for semiconductor wafer processing, method for producing semiconductor chip, and method for using the tape 古河电气工业株式会社 2022-05-24 CN disclosed
CN-114364761-A Adhesive tape for semiconductor processing 古河电气工业株式会社 2022-04-15 CN disclosed
CN-108137845-B System and method for producing cast-in-place foam 巴斯夫欧洲公司 2021-08-17 CN disclosed
US-11091601-B2 Process for producing an in-situ foam BASF SE (DE) 2021-08-17 US disclosed
CN-107112222-B Wafer fixing tape, semiconductor wafer processing method and semiconductor chip 古河电气工业株式会社 2021-03-16 CN disclosed
US-20060204749-A1 Wafer-processing tape THE FURUKAWA ELECTRIC CO., LTD. 2006-09-14 US disclosed
US-7081503-B2 Process producing vinyl polymer having alkenyl group at end, vinyl polymer, and curable composition KANEKA CORPORATION (JP) 2006-07-25 US disclosed
US-7009004-B2 Process for producing vinyl polymer having alkenyl group at end vinyl polymer and curable composition KANEKA CORPORATION (JP) 2006-03-07 US disclosed
US-20060004171-A1 Process for producing vinyl polymer having alkenyl group at end, vinyl polymer, and curable composition TSUJI RYOTARO 2006-01-05 US disclosed
US-20050249909-A1 Wafer-adhering adhesive tape THE FURUKAWA ELECTRIC CO., LTD. 2005-11-10 US disclosed
EP-1591504-A1 PRESSURE-SENSITIVE ADHESIVE TAPE FOR PASTING WAFER THERETO The Furukawa Electric Co., Ltd. (JP) 2005-11-02 EP disclosed
US-20050004318-A1 Curable composition OHSHIRO NOBUAKI (JP) 2005-01-06 US disclosed
EP-1452550-A1 CURABLE COMPOSITION KANEKA CORPORATION (JP) 2004-09-01 EP disclosed
US-20040097678-A1 Process for producing vinyl polymer having alkenyl group at end vinyl polymer and curable composition KANEKA CORPORATION (JP) 2004-05-20 US disclosed
EP-1375531-A1 PROCESS FOR PRODUCING VINYL POLYMER HAVING ALKENYL GROUP AT END, VINYL POLYMER, AND CURABLE COMPOSITION KANEKA CORPORATION (JP) 2004-01-02 EP disclosed