SCHEMBL25517872

SCHEMBL25517872

C=C(C)C(=O)OC1(C)CC2CC(CC(C)(OC(=O)OCC(F)(F)S(=O)(=O)O)C2)C1

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL25515301 0.90 — —
SCHEMBL25455807 0.85 — —
SCHEMBL25517876 0.81 — —
SCHEMBL20306451 0.80 NPSR1 (0.32) —
SCHEMBL14999029 0.79 — —
SCHEMBL25517868 0.78 — —
SCHEMBL10134899 0.77 NPSR1 (0.36) —
SCHEMBL19042196 0.77 NPSR1 (0.36) —
SCHEMBL18785739 0.76 — —
SCHEMBL12376785 0.75 ALDH1A1 (0.38) —

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20230161243-A1 SALT, ACID GENERATOR, RESIN, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2023-05-25 — — US disclosed
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