SCHEMBL25523337

SCHEMBL25523337

O=C1Nc2ccccc2C1(c1ccc(OC2=CC=C(O)CC2)cc1)c1ccc(Oc2ccc(O)cc2)cc1

nearest known ligand 0.61

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
CHRM2 P08172 1/20 0.61
ADORA3 P0DMS8 1/20 0.61
KCNH2 Q12809 1/20 0.61
MAPT P10636 2/20 0.50
LMNA P02545 2/20 0.46
MEN1 O00255 3/20 0.43
KMT2A Q03164 3/20 0.43
XBP1 P17861 1/20 0.43
NPSR1 Q6W5P4 1/20 0.43
SMN1; SMN2 Q16637 1/20 0.42
CNR1 P21554 2/20 0.39
GPR55 Q9Y2T6 2/20 0.39
HTT P42858 1/20 0.39
GPR35 Q9HC97 1/20 0.39
LTA4H P09960 1/20 0.33
NR1H2 P55055 1/20 0.33
BAX Q07812 1/20 0.33
MGAM O43451 2/20 0.33
GAA P10253 2/20 0.33
SI P14410 2/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL25502467 0.86 CHRM2 (0.82) CHRM2ADORA3KCNH2MAPTLMNA
SCHEMBL13145362 0.84 CHRM2 (0.78) CHRM2ADORA3KCNH2MAPTLMNA
Oxyphenisatine SCHEMBL239513 0.78 CHRM2 (1.00) CHRM2ADORA3KCNH2MAPTLMNA
Oxyphenisatine SCHEMBL35387956 0.78 CHRM2 (1.00) CHRM2ADORA3KCNH2MAPTLMNA
SCHEMBL11748640 0.76 CHRM2 (0.78) CHRM2ADORA3KCNH2MAPTLMNA
SCHEMBL3198592 0.76 CHRM2 (0.78) CHRM2ADORA3KCNH2MAPTLMNA
SCHEMBL2716060 0.75 CHRM2 (0.93) CHRM2ADORA3KCNH2MAPTLMNA
SCHEMBL11748631 0.73 CHRM2 (0.72) CHRM2ADORA3KCNH2MAPTLMNA
SCHEMBL7031893 0.72 CHRM2 (0.85) CHRM2ADORA3KCNH2MAPTLMNA
SCHEMBL13145364 0.72 CHRM2 (0.85) CHRM2ADORA3KCNH2MAPTLMNA

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-4184248-A1 COMPOSITION FOR FORMING ORGANIC FILM, PATTERNING PROCESS, AND COMPOUND AND POLYMER FOR FORMING ORGANIC FILM Shin-Etsu Chemical Co., Ltd. (JP) 2023-05-24 EP disclosed