Predicted protein targets (top 8)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | POLB | P06746 | 1/20 | 0.47 |
| ▸ | ALDH1A1 | P00352 | 4/20 | 0.43 |
| ▸ | THRB | P10828 | 1/20 | 0.43 |
| ▸ | LMNA | P02545 | 1/20 | 0.40 |
| ▸ | TSHR | P16473 | 1/20 | 0.39 |
| ▸ | MEN1 | O00255 | 2/20 | 0.38 |
| ▸ | KMT2A | Q03164 | 2/20 | 0.38 |
| ▸ | GAA | P10253 | 1/20 | 0.35 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL25527400 | 0.82 | POLB (0.53) | POLBALDH1A1THRBLMNATSHR | |
| SCHEMBL25527396 | 0.82 | PKM (0.40) | ALDH1A1THRBTSHRMEN1KMT2A | |
| SCHEMBL14433714 | 0.72 | POLB (0.75) | POLBALDH1A1THRBLMNATSHR | |
| SCHEMBL13589979 | 0.72 | POLB (0.75) | POLBALDH1A1THRBLMNATSHR | |
| SCHEMBL29838840 | 0.72 | POLB (0.75) | POLBALDH1A1THRBLMNATSHR | |
| SCHEMBL14493662 | 0.72 | POLB (0.75) | POLBALDH1A1THRBLMNATSHR | |
| SCHEMBL1058665 | 0.72 | POLB (0.75) | POLBALDH1A1THRBLMNATSHR | |
| SCHEMBL14691655 | 0.68 | POLB (0.39) | POLBALDH1A1THRBLMNATSHR | |
| SCHEMBL3289593 | 0.68 | POLB (0.64) | POLBALDH1A1THRBLMNATSHR | |
| SCHEMBL12932439 | 0.68 | POLB (0.51) | POLBALDH1A1THRBLMNATSHR |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20230152696-A1 | POSITIVE RESIST COMPOSITION AND PATTERN FORMING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-05-18 | — | — | US | disclosed |
| US-20230152696-A1 | POSITIVE RESIST COMPOSITION AND PATTERN FORMING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-05-18 | — | — | US | disclosed |