Predicted protein targets (top 13)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.45 |
| ▸ | LMNA | P02545 | 1/20 | 0.33 |
| ▸ | IDO1 | P14902 | 1/20 | 0.33 |
| ▸ | EPHX1 | P07099 | 2/20 | 0.32 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.32 |
| ▸ | CASP3 | P42574 | 1/20 | 0.32 |
| ▸ | CPN1 | P15169 | 1/20 | 0.31 |
| ▸ | CPB2 | Q96IY4 | 1/20 | 0.31 |
| ▸ | CASP1 | P29466 | 1/20 | 0.31 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.31 |
| ▸ | FFAR1 | O14842 | 1/20 | 0.31 |
| ▸ | METAP2 | P50579 | 2/20 | 0.30 |
| ▸ | METAP1 | P53582 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL25527410 | 0.98 | ALDH1A1 (0.42) | ALDH1A1LMNAIDO1EPHX1L3MBTL1 | |
| SCHEMBL25527278 | 0.87 | ALDH1A1 (0.42) | ALDH1A1LMNAIDO1EPHX1L3MBTL1 | |
| SCHEMBL25527279 | 0.87 | ALDH1A1 (0.42) | ALDH1A1LMNAIDO1EPHX1L3MBTL1 | |
| SCHEMBL25527281 | 0.85 | ALDH1A1 (0.40) | ALDH1A1LMNAIDO1EPHX1L3MBTL1 | |
| SCHEMBL25946700 | 0.83 | ALDH1A1 (0.45) | ALDH1A1LMNAIDO1EPHX1L3MBTL1 | |
| SCHEMBL25946695 | 0.81 | ALDH1A1 (0.42) | ALDH1A1LMNAIDO1L3MBTL1CASP3 | |
| SCHEMBL25946896 | 0.75 | ALDH1A1 (0.44) | ALDH1A1LMNAIDO1EPHX1L3MBTL1 | |
| SCHEMBL25946898 | 0.73 | ALDH1A1 (0.41) | ALDH1A1CASP3SMN1; SMN2FFAR1 | |
| SCHEMBL25527456 | 0.73 | FFAR1 (0.32) | FFAR1 | |
| SCHEMBL27998859 | 0.72 | ALDH1A1 (0.47) | ALDH1A1LMNAEPHX1L3MBTL1SMN1; SMN2 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20230152696-A1 | POSITIVE RESIST COMPOSITION AND PATTERN FORMING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-05-18 | — | — | US | disclosed |