SCHEMBL25527904

SCHEMBL25527904

BCc1cc(CB)c(CB)c(C(=O)OC2CC(OC(=O)c3cc(B)cc(B)c3CB)CC(OC(=O)c3cc(CB)cc(CB)c3CB)C2C(=O)OC(CS(=O)(=O)O)C(F)(F)F)c1

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL27048337 0.96 — —
SCHEMBL25476174 0.94 — —
SCHEMBL25476175 0.84 — —
SCHEMBL25476130 0.81 — —
SCHEMBL25476133 0.80 — —
SCHEMBL25527820 0.80 — —
SCHEMBL25476163 0.80 — —
SCHEMBL25527825 0.79 — —
SCHEMBL25476164 0.79 — —
SCHEMBL25527888 0.79 — —

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20230152696-A1 POSITIVE RESIST COMPOSITION AND PATTERN FORMING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-05-18 — — US disclosed
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