⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL25527904 | 0.96 | — | — | |
| SCHEMBL25476174 | 0.96 | — | — | |
| SCHEMBL25476175 | 0.86 | — | — | |
| SCHEMBL25476130 | 0.82 | — | — | |
| SCHEMBL25476133 | 0.82 | — | — | |
| SCHEMBL25476163 | 0.81 | — | — | |
| SCHEMBL25476164 | 0.81 | — | — | |
| SCHEMBL25737028 | 0.79 | — | — | |
| SCHEMBL25476131 | 0.77 | — | — | |
| SCHEMBL25476390 | 0.77 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20240027902-A1 | CHEMICALLY AMPLIFIED RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2024-01-25 | — | — | US | disclosed |