SCHEMBL25527943

SCHEMBL25527943

BCc1c(B)cc(B)cc1C(=O)OCCS(=O)(=O)O

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL25527949 0.86 — —
SCHEMBL26833791 0.86 STS (0.34) —
SCHEMBL25528078 0.83 SERPINE1 (0.34) —
SCHEMBL25527928 0.82 ALDH1A1 (0.32) —
SCHEMBL25527944 0.81 — —
SCHEMBL25527940 0.81 ALDH1A1 (0.37) —
SCHEMBL25527920 0.79 SERPINE1 (0.33) —
SCHEMBL25737071 0.79 SERPINE1 (0.30) —
SCHEMBL25527915 0.75 CA12 (0.43) —
SCHEMBL25527919 0.74 SERPINE1 (0.42) —

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20230152696-A1 POSITIVE RESIST COMPOSITION AND PATTERN FORMING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-05-18 — — US disclosed
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