SCHEMBL2554735

SCHEMBL2554735

O[SiH3].O[SiH3].O[SiH3].O[SiH3]

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL397781 1.00
SCHEMBL18357 1.00
SCHEMBL8969621 1.00
SCHEMBL7880376 0.87
SCHEMBL5025861 0.87
SCHEMBL1657682 0.87
SCHEMBL3239793 0.87
SCHEMBL2238617 0.87
Hydrochloric Acid SCHEMBL7202238 0.87
SCHEMBL869965 0.87

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-2552980-A1 SILYLATED POLYURETHANE/POLYORGANOSILOXANE BLEND AND SEALANT COMPOSITION AND FUMED SILICA COMPOSITION CONTAING SAME Momentive Performance Materials Inc. (US) 2013-02-06 EP disclosed
WO-2011123355-A1 SILYLATED POLYURETHANE/POLYORGANOSILOXANE BLEND AND SEALANT COMPOSITION AND FUMED SILICA COMPOSITION CONTAING SAME MOMENTIVE PERFORMANCE MATERIALS INC. (US) 2011-10-06 WO disclosed
US-5541002-A NONCURLING WHEN PRINTED WITH AQUEOUS INKS FUJI XEROX CO., LTD. (JP) 1996-07-30 US disclosed