Predicted protein targets (top 19)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 4/20 | 0.55 |
| ▸ | KMT2A | Q03164 | 2/20 | 0.42 |
| ▸ | TET3 | O43151 | 1/20 | 0.42 |
| ▸ | FBXL19 | Q6PCT2 | 1/20 | 0.42 |
| ▸ | CXXC5 | Q7LFL8 | 1/20 | 0.42 |
| ▸ | TET1 | Q8NFU7 | 1/20 | 0.42 |
| ▸ | KDM2B | Q8NHM5 | 1/20 | 0.42 |
| ▸ | CXXC4 | Q9H2H0 | 1/20 | 0.42 |
| ▸ | KDM2A | Q9Y2K7 | 1/20 | 0.42 |
| ▸ | HPGD | P15428 | 2/20 | 0.41 |
| ▸ | MMP1 | P03956 | 1/20 | 0.41 |
| ▸ | MMP2 | P08253 | 1/20 | 0.41 |
| ▸ | MMP3 | P08254 | 1/20 | 0.41 |
| ▸ | MMP9 | P14780 | 1/20 | 0.41 |
| ▸ | TGM2 | P21980 | 1/20 | 0.40 |
| ▸ | MEN1 | O00255 | 1/20 | 0.40 |
| ▸ | GAA | P10253 | 1/20 | 0.39 |
| ▸ | CA2 | P00918 | 1/20 | 0.39 |
| ▸ | CHKA | P35790 | 1/20 | 0.39 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL10660748 | 1.00 | ALDH1A1 (0.55) | ALDH1A1KMT2ATET3FBXL19CXXC5 | |
| SCHEMBL25690078 | 1.00 | ALDH1A1 (0.55) | ALDH1A1KMT2ATET3FBXL19CXXC5 | |
| SCHEMBL329111 | 1.00 | ALDH1A1 (0.55) | ALDH1A1KMT2ATET3FBXL19CXXC5 | |
| SCHEMBL10661213 | 1.00 | ALDH1A1 (0.55) | ALDH1A1KMT2ATET3FBXL19CXXC5 | |
| SCHEMBL37699 | 1.00 | ALDH1A1 (0.55) | ALDH1A1KMT2ATET3FBXL19CXXC5 | |
| SCHEMBL25231611 | 1.00 | ALDH1A1 (0.55) | ALDH1A1KMT2ATET3FBXL19CXXC5 | |
| SCHEMBL2558338 | 1.00 | ALDH1A1 (0.55) | ALDH1A1KMT2ATET3FBXL19CXXC5 | |
| SCHEMBL10658257 | 1.00 | ALDH1A1 (0.55) | ALDH1A1KMT2ATET3FBXL19CXXC5 | |
| SCHEMBL20664588 | 1.00 | ALDH1A1 (0.55) | ALDH1A1KMT2ATET3FBXL19CXXC5 | |
| SCHEMBL149678 | 0.97 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 19 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| WO-2024245366-A1 | COPOLYMER, COMPOSITION AND USE THEREOF | 北京马普新材料有限公司 | 2024-12-05 | — | — | WO | claimed |
| US-20130261275-A1 | NON-HOMOPOLYMERS EXHIBITING GAS HYDRATE INHIBITION, SALT TOLERANCE AND HIGH CLOUD POINT | ISP INVESTMENTS INC. (US) | 2013-10-03 | — | — | US | claimed |
| WO-2012054569-A2 | NON-HOMOPOLYMERS EXHIBITING GAS HYDRATE INHIBITION, SALT TOLERANCE AND HIGH CLOUD POINT | ISP INVESTMENTS INC. (US) | 2012-04-26 | — | — | WO | claimed |
| EP-4514866-A1 | POLYMER AND USE THEREOF AS A HYDROCARBON VISCOSITY REDUCING AGENT | SNF Group (FR) | 2025-03-05 | — | — | EP | disclosed |
| WO-2025031414-A1 | TREATMENT AGENT AND FIBER FABRIC OR COATING | 北京马普新材料有限公司 | 2025-02-13 | — | — | WO | disclosed |
| WO-2025012561-A1 | POLYMER AND USE THEREOF AS A HYDROCARBON VISCOSITY REDUCING AGENT | SNF GROUP (FR) | 2025-01-16 | — | — | WO | disclosed |
| WO-2023090302-A1 | ACTIVE ENERGY RAY-CURABLE COMPOSITION | ＫＪケミカルズ株式会社 | 2023-05-25 | — | — | WO | disclosed |
| CN-105315947-B | Adhesive composition and surface protective film | 藤森工业株式会社 | 2023-02-17 | — | — | CN | disclosed |
| CN-115612420-A | Surface protective film and optical component | 藤森工业株式会社 | 2023-01-17 | — | — | CN | disclosed |
| CN-115612421-A | Surface protective film and optical component | 藤森工业株式会社 | 2023-01-17 | — | — | CN | disclosed |
| CN-115584226-A | Adhesive composition for optical film, adhesive layer for optical film, and adhesive film for optical film | 藤森工业株式会社 | 2023-01-10 | — | — | CN | disclosed |
| CN-110423305-B | Preparation of Fe3O4Method for @ PVP @ PNIPAM magnetic photonic crystal nano-chain particles | 武汉理工大学 | 2021-07-20 | — | — | CN | disclosed |
| EP-3819931-A1 | PROTECTIVE FILM FORMING AGENT, METHOD FOR PRODUCING SEMICONDUCTOR CHIP, AND METHOD FOR PRODUCING (METH)ACRYLIC RESIN | TOKYO OHKA KOGYO CO., LTD. (JP) | 2021-05-12 | — | — | EP | disclosed |
| EP-3605588-A1 | POLISHING COMPOSITION | Fujimi Incorporated (JP) | 2020-02-05 | — | — | EP | disclosed |
| US-9493598-B2 | Polymers having acid and amide moieties, and uses thereof | ISP INVESTMENTS LLC (US) | 2016-11-15 | — | — | US | disclosed |
| US-20130261275-A1 | NON-HOMOPOLYMERS EXHIBITING GAS HYDRATE INHIBITION, SALT TOLERANCE AND HIGH CLOUD POINT | ISP INVESTMENTS INC. (US) | 2013-10-03 | — | — | US | disclosed |
| US-20130123147-A1 | POLYMERS HAVING ACID AND AMIDE MOIETIES, AND USES THEREOF | ISP INVESTMENTS INC. (US) | 2013-05-16 | — | — | US | disclosed |
| WO-2012054569-A2 | NON-HOMOPOLYMERS EXHIBITING GAS HYDRATE INHIBITION, SALT TOLERANCE AND HIGH CLOUD POINT | ISP INVESTMENTS INC. (US) | 2012-04-26 | — | — | WO | disclosed |
| WO-2011130370-A1 | POLYMERS HAVING ACID AND AMIDE MOIETIES, AND USES THEREOF | ISP INVESTMENTS INC. (US) | 2011-10-20 | — | — | WO | disclosed |