SCHEMBL25560217

SCHEMBL25560217

CCC(C)C(=O)OCCNC(=O)n1nc(C)cc1C

nearest known ligand 0.41

Predicted protein targets (top 19)

geneUniProtsupporting neighboursconfidence
ASAH1 Q13510 1/20 0.41
TSHR P16473 1/20 0.40
ALDH1A1 P00352 3/20 0.40
MEN1 O00255 2/20 0.40
KMT2A Q03164 2/20 0.40
L3MBTL1 Q9Y468 2/20 0.40
CYP1A2 P05177 1/20 0.40
CYP3A4 P08684 1/20 0.40
CYP2C9 P11712 1/20 0.40
CYP2C19 P33261 1/20 0.40
MAPK1 P28482 1/20 0.40
HPGD P15428 3/20 0.39
TP53 P04637 1/20 0.39
APAF1 O14727 1/20 0.38
LMNA P02545 1/20 0.38
POLB P06746 1/20 0.38
GAA P10253 1/20 0.38
SMN1; SMN2 Q16637 1/20 0.38
KDM4E B2RXH2 1/20 0.38

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL24218338 0.80 ASAH1 (0.43) ASAH1TSHRALDH1A1MEN1KMT2A
SCHEMBL32666117 0.79 TSHR (0.56) ASAH1TSHRALDH1A1MEN1KMT2A
SCHEMBL24218315 0.79 ASAH1 (0.38) ASAH1TSHRALDH1A1MEN1KMT2A
SCHEMBL273285 0.79 TSHR (0.41) ASAH1TSHRALDH1A1MEN1KMT2A
SCHEMBL15080919 0.75 ASAH1 (0.42) ASAH1TSHRALDH1A1MEN1KMT2A
SCHEMBL3810000 0.75 ASAH1 (0.60) ASAH1TSHRALDH1A1MEN1KMT2A
SCHEMBL32666111 0.75 ASAH1 (0.60) ASAH1TSHRALDH1A1MEN1KMT2A
SCHEMBL13248693 0.75 TSHR (0.51) ASAH1TSHRALDH1A1MEN1KMT2A
SCHEMBL20097519 0.75 LMNA (0.52) TSHRALDH1A1MEN1KMT2AHPGD
SCHEMBL12384029 0.75 ASAH1 (0.39) ASAH1TSHRALDH1A1MEN1KMT2A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-12044968-B2 Protective film-forming composition having acetal structure and amide structure NISSAN CHEMICAL CORPORATION (JP) 2024-07-23 US disclosed
US-12044968-B2 Protective film-forming composition having acetal structure and amide structure NISSAN CHEMICAL CORPORATION (JP) 2024-07-23 US disclosed
US-11675270-B2 Resist underlayer film-forming composition NISSAN CHEMICAL CORPORATION (JP) 2023-06-13 US disclosed