SCHEMBL25568988

SCHEMBL25568988

CC(C)(C)OC12CC3CC(C1)CC(C(=O)OCCC(F)(F)C(C)(F)F)(C3)C2

nearest known ligand 0.45

Predicted protein targets (top 17)

geneUniProtsupporting neighboursconfidence
NPSR1 Q6W5P4 2/20 0.45
ALDH1A1 P00352 3/20 0.34
L3MBTL1 Q9Y468 3/20 0.33
MEN1 O00255 3/20 0.33
KMT2A Q03164 3/20 0.33
LMNA P02545 1/20 0.32
RXFP1 Q9HBX9 1/20 0.32
CYP17A1 P05093 2/20 0.32
CYP19A1 P11511 2/20 0.32
ABL1 P00519 1/20 0.31
TSHR P16473 1/20 0.31
RIN1 Q13671 1/20 0.31
MAPT P10636 1/20 0.31
HTT P42858 1/20 0.31
NPC1 O15118 1/20 0.31
RAB9A P51151 1/20 0.31
SMN1; SMN2 Q16637 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL24268504 0.88 NPSR1 (0.41) NPSR1ALDH1A1L3MBTL1MEN1KMT2A
SCHEMBL19929337 0.85 NPSR1 (0.43) NPSR1ALDH1A1L3MBTL1MEN1KMT2A
SCHEMBL16213977 0.84 NPSR1 (0.51) NPSR1ALDH1A1L3MBTL1MEN1KMT2A
SCHEMBL8797812 0.84 NPSR1 (0.51) NPSR1ALDH1A1L3MBTL1LMNAABL1
SCHEMBL16213976 0.84 NPSR1 (0.51) NPSR1ALDH1A1L3MBTL1MEN1KMT2A
SCHEMBL25568859 0.84 NPSR1 (0.43) NPSR1ALDH1A1L3MBTL1MEN1KMT2A
SCHEMBL27008287 0.83 NPSR1 (0.41) NPSR1ALDH1A1L3MBTL1MEN1KMT2A
SCHEMBL8798343 0.83 NPSR1 (0.44) NPSR1ALDH1A1MEN1KMT2ALMNA
SCHEMBL24268511 0.79 NPSR1 (0.40) NPSR1ALDH1A1ABL1TSHRRIN1
SCHEMBL13450026 0.79 NPSR1 (0.43) NPSR1ALDH1A1L3MBTL1MEN1KMT2A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20230375928-A1 Sulfonium-Salt-Type Polymerizable Monomer, Polymer Photoacid Generator, Base Rein, Resist Composition, And Patterning Process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-11-23 US disclosed
US-20230161254-A1 CHEMICALLY AMPLIFIED RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-05-25 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20230375928-A1 Sulfonium-Salt-Type Polymerizable Monomer, Polymer Photoacid Generator, Base Rein, Resist Composition, And Patterning Process NAF1, RALA, RSU1 NPSR1 1534/4885ALDH1A1 1459/4885L3MBTL1 2407/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.