SCHEMBL25596647

SCHEMBL25596647

O=C1C2CC3CC1CC(C(=O)OCC1OC4(OC1COC(=O)C15CC6CC(CC(C6)C1)C5)C1CC5CC(C1)CC4C5)(C3)C2

nearest known ligand 0.39

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
CYP17A1 P05093 2/20 0.37
CYP19A1 P11511 2/20 0.37
ALDH1A1 P00352 5/20 0.37
MEN1 O00255 3/20 0.37
KMT2A Q03164 3/20 0.37
ATM Q13315 1/20 0.37
MAPT P10636 3/20 0.36
NPSR1 Q6W5P4 2/20 0.36
POLB P06746 2/20 0.36
TSHR P16473 2/20 0.36
GAA P10253 2/20 0.36
MAPK1 P28482 1/20 0.36
PRKCA P17252 1/20 0.36
EPHX2 P34913 1/20 0.34
NPC1 O15118 1/20 0.34
RAB9A P51151 1/20 0.34
KDM4E B2RXH2 1/20 0.33
RECQL P46063 1/20 0.33
PKM P14618 1/20 0.33
XBP1 P17861 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL19601026 1.00 CYP17A1 (0.37) CYP17A1CYP19A1ALDH1A1MEN1KMT2A
SCHEMBL19601626 0.92 ALDH1A1 (0.36) CYP17A1CYP19A1ALDH1A1MEN1KMT2A
SCHEMBL26343187 0.90 ALDH1A1 (0.36) CYP17A1CYP19A1ALDH1A1MEN1KMT2A
SCHEMBL19601022 0.90 ALDH1A1 (0.43) CYP17A1CYP19A1ALDH1A1MEN1KMT2A
SCHEMBL26061953 0.89 ALDH1A1 (0.34) CYP17A1CYP19A1ALDH1A1MEN1KMT2A
SCHEMBL26011363 0.86 MEN1 (0.31) ALDH1A1MEN1KMT2AATM
SCHEMBL26375744 0.84 MEN1 (0.32) ALDH1A1MEN1KMT2AATMNPSR1
SCHEMBL19601019 0.84 CYP17A1 (0.34) CYP17A1CYP19A1ALDH1A1MEN1KMT2A
SCHEMBL19601018 0.83 CYP17A1 (0.41) CYP17A1CYP19A1ALDH1A1MEN1KMT2A
SCHEMBL26375633 0.82 ALDH1A1 (0.33) ALDH1A1MEN1KMT2AATMNPC1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11681224-B2 Resin, resist composition and method for producing resist pattern SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2023-06-20 US disclosed