SCHEMBL255991

SCHEMBL255991

Cc1ccc(O)c(CO)c1

nearest known ligand 0.61

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
AMY1A P0DUB6 1/20 0.61
KLF10 Q13118 1/20 0.55
TRPA1 O75762 1/20 0.54
PKM P14618 1/20 0.53
TP53 P04637 2/20 0.52
TDP1 Q9NUW8 2/20 0.52
HTT P42858 1/20 0.49
ALOX15 P16050 3/20 0.48
HSD17B10 Q99714 2/20 0.48
ALDH1A1 P00352 1/20 0.48
LMNA P02545 2/20 0.46
HPGD P15428 2/20 0.46
MEN1 O00255 1/20 0.46
GAA P10253 1/20 0.46
MAPT P10636 1/20 0.46
ALOX12 P18054 1/20 0.46
KMT2A Q03164 1/20 0.46
NPSR1 Q6W5P4 1/20 0.45
CSNK2A1 P68400 1/20 0.43
ADRB2 P07550 2/20 0.42

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL29395472 1.00 AMY1A (0.61) AMY1AKLF10TRPA1PKMTP53
SCHEMBL10533387 0.84 AMY1A (0.46) AMY1AKLF10TRPA1PKMTP53
SCHEMBL9008165 0.83 AMY1A (0.63) AMY1ATRPA1TP53TDP1HTT
SCHEMBL29402131 0.83 AMY1A (0.83) AMY1ATRPA1TP53TDP1HTT
SCHEMBL50622 0.83 AMY1A (0.83) AMY1ATRPA1TP53TDP1HTT
SCHEMBL29621432 0.83 AMY1A (0.83) AMY1ATRPA1TP53TDP1HTT
SCHEMBL211105 0.82 AMY1A (0.86) AMY1AKLF10TRPA1PKMTP53
SCHEMBL31539953 0.82 AMY1A (0.57) AMY1AKLF10TRPA1TP53TDP1
SCHEMBL7758857 0.82 AMY1A (0.57) AMY1AKLF10TRPA1TP53TDP1
SCHEMBL1023280 0.81 AMY1A (0.61) AMY1ATRPA1TP53TDP1HTT

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 542 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-118307597-A Mitochondrial-targeted hypoxia response prodrug as well as preparation method and application thereof 中山大学 2024-07-09 CN claimed
CN-117430814-A Preparation method of electronic grade phenolic resin 山东宇世巨化工有限公司 2024-01-23 CN claimed
CN-116209699-A Polyacetal-based releasable compositions 德路工业胶粘剂有限两合公司 2023-06-02 CN claimed
CN-112851650-B Preparation method and application of fluorescent probe for ultra-fast detection of biological thiol 山西大学 2022-05-31 CN claimed
CN-111290216-B Hard mask composition, hard mask and method for forming pattern 厦门恒坤新材料科技股份有限公司 2022-05-20 CN claimed
CN-111240153-B Hard mask composition, hard mask and method for forming pattern 厦门恒坤新材料科技股份有限公司 2022-05-20 CN claimed
CN-112920398-B Amphiphilic compound based on nitroreductase stimulation response and preparation method and application thereof 北京师范大学 2022-03-01 CN claimed
CN-113461395-A Sintering-free flyash brick and preparation method thereof 涡阳县晟丰新型建材有限公司 2021-10-01 CN claimed
CN-112920398-A Amphiphilic compound based on nitroreductase stimulation response and preparation method and application thereof 北京师范大学 2021-06-08 CN claimed
CN-112851650-A Preparation method and application of fluorescent probe for ultra-fast detection of biological thiol 山西大学 2021-05-28 CN claimed
CN-1585097-A Antireflective hardmask and uses thereof IBM (US) 2005-02-23 CN claimed
EP-0997777-B1 Photosensitive polymer composition, method for forming relief patterns, and electronic parts HITACHI CHEM DUPONT MICROSYS (JP) 2003-06-04 EP claimed
US-5981135-A CONSISTING OF A PHOTOACID GENERATOR AND AN ACID FUNCTIONAL CELLULOSIC RESIN MORTON INTERNATIONAL, INC. (US) 1999-11-09 US claimed
US-5510420-A NUCLEOPHILIC GRAFTING OF PARENT POLYMER HAVING AROMATIC RINGS CONTAINING REACTIVE GROUPS HOECHST CELANESE CORPORATION (US) 1996-04-23 US claimed
EP-0686274-A1 NOVEL MATRIX RESIN FOR HIGH-TEMPERATURE STABLE PHOTOIMAGEABLE COMPOSITIONS HOECHST CELANESE CORPORATION (US) 1995-12-13 EP claimed
WO-1994019724-A1 NOVEL MATRIX RESIN FOR HIGH-TEMPERATURE STABLE PHOTOIMAGEABLE COMPOSITIONS HOECHST CELANESE CORPORATION (US) 1994-09-01 WO claimed
US-4929530-A OXIDATIVE LEUCO DYES, PHOTO-OXIDIZERS, REDUCING AGENTS, ORGANIC SULFONAMIDES AND PHENOLIC COMPONENTS; EXPOSING TO LIGHT FUJI PHOTO FILM CO., LTD. (JP) 1990-05-29 US claimed
EP-0288533-A4 IMAGE REVERSAL SYSTEM AND PROCESS. MACDERMID INC (US) 1989-02-06 EP claimed
EP-0288533-A1 IMAGE REVERSAL SYSTEM AND PROCESS MACDERMID INCORPORATED (US) 1988-11-02 EP claimed
WO-1988002878-A1 IMAGE REVERSAL SYSTEM AND PROCESS MACDERMID, INCORPORATED (US) 1988-04-21 WO claimed