SCHEMBL25604362

SCHEMBL25604362

O=COCC(F)(F)S(=O)(=O)O

nearest known ligand 0.31

Predicted protein targets (top 2)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 1/20 0.31
L3MBTL1 Q9Y468 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL13941309 0.75
SCHEMBL4401187 0.73 ALDH1A1 (0.35) ALDH1A1L3MBTL1
SCHEMBL6366627 0.71 F2 (0.34) ALDH1A1L3MBTL1
SCHEMBL97014 0.69
SCHEMBL14946652 0.69 ALDH1A1 (0.35) ALDH1A1L3MBTL1
SCHEMBL18785580 0.68 ALDH1A1 (0.31) ALDH1A1L3MBTL1
SCHEMBL22437516 0.68 ALDH1A1 (0.36) ALDH1A1L3MBTL1
SCHEMBL15083764 0.68 ALDH1A1 (0.37) ALDH1A1L3MBTL1
SCHEMBL14228084 0.68 CES1 (0.38) ALDH1A1L3MBTL1
Hydrochloric Acid SCHEMBL4073144 0.67

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-4194949-A1 PHOTOACID GENERATOR, PHOTORESIST COMPOSITION INCLUDING THE SAME, AND METHOD OF FORMING A PATTERN USING THE PHOTOACID GENERATOR Samsung Electronics Co., Ltd. (KR) 2023-06-14 EP disclosed