⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL17577429 | 0.84 | — | — | |
| SCHEMBL9973378 | 0.81 | HMGCR (0.31) | — | |
| SCHEMBL25657901 | 0.81 | — | — | |
| SCHEMBL25657902 | 0.79 | — | — | |
| SCHEMBL16139542 | 0.78 | — | — | |
| SCHEMBL107167 | 0.77 | HMGCR (0.32) | — | |
| SCHEMBL19058052 | 0.77 | HMGCR (0.32) | — | |
| SCHEMBL10228568 | 0.77 | HMGCR (0.32) | — | |
| SCHEMBL16810003 | 0.77 | HMGCR (0.32) | — | |
| SCHEMBL18898095 | 0.76 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-11709425-B2 | Resist composition and method of forming resist pattern | TOKYO OHKA KOGYO CO., LTD. (JP) | 2023-07-25 | — | — | US | disclosed |
| US-11703756-B2 | Resist composition and method of forming resist pattern | TOKYO OHKA KOGYO CO., LTD. (JP) | 2023-07-18 | — | — | US | disclosed |
| US-11650497-B2 | Resist composition and method of forming resist pattern | TOKYO OHKA KOGYO CO., LTD. (JP) | 2023-05-16 | — | — | US | disclosed |