⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL2754976 | 0.80 | HMGCR (0.34) | — | |
| SCHEMBL25657903 | 0.79 | — | — | |
| SCHEMBL9608725 | 0.76 | KDM4E (0.31) | — | |
| SCHEMBL2740789 | 0.75 | — | — | |
| SCHEMBL19261203 | 0.74 | — | — | |
| SCHEMBL9945783 | 0.73 | ALDH1A1 (0.30) | — | |
| SCHEMBL13496332 | 0.73 | — | — | |
| SCHEMBL13651400 | 0.73 | — | — | |
| SCHEMBL12018701 | 0.73 | — | — | |
| SCHEMBL14649806 | 0.72 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-11709425-B2 | Resist composition and method of forming resist pattern | TOKYO OHKA KOGYO CO., LTD. (JP) | 2023-07-25 | — | — | US | disclosed |
| US-11703756-B2 | Resist composition and method of forming resist pattern | TOKYO OHKA KOGYO CO., LTD. (JP) | 2023-07-18 | — | — | US | disclosed |
| US-11650497-B2 | Resist composition and method of forming resist pattern | TOKYO OHKA KOGYO CO., LTD. (JP) | 2023-05-16 | — | — | US | disclosed |