Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 9/20 | 0.45 |
| ▸ | LMNA | P02545 | 6/20 | 0.45 |
| ▸ | TSHR | P16473 | 6/20 | 0.45 |
| ▸ | HTT | P42858 | 3/20 | 0.45 |
| ▸ | MCOLN3 | Q8TDD5 | 1/20 | 0.45 |
| ▸ | HPGD | P15428 | 6/20 | 0.40 |
| ▸ | NPSR1 | Q6W5P4 | 3/20 | 0.40 |
| ▸ | MAPT | P10636 | 3/20 | 0.40 |
| ▸ | ALOX12 | P18054 | 2/20 | 0.40 |
| ▸ | NTSR1 | P30989 | 1/20 | 0.40 |
| ▸ | CCR6 | P51684 | 1/20 | 0.40 |
| ▸ | MCL1 | Q07820 | 1/20 | 0.40 |
| ▸ | MEN1 | O00255 | 1/20 | 0.37 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.37 |
| ▸ | SMN1; SMN2 | Q16637 | 3/20 | 0.37 |
| ▸ | GAA | P10253 | 2/20 | 0.37 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.37 |
| ▸ | RECQL | P46063 | 1/20 | 0.37 |
| ▸ | HSD17B10 | Q99714 | 3/20 | 0.36 |
| ▸ | PKM | P14618 | 1/20 | 0.36 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL25694926 | 0.98 | ALDH1A1 (0.47) | ALDH1A1LMNATSHRHTTMCOLN3 | |
| SCHEMBL25714980 | 0.88 | CNR1 (0.44) | TSHRHTTMEN1KMT2ASMN1; SMN2 | |
| SCHEMBL21820781 | 0.86 | SLC2A1 (0.45) | HTTMEN1KMT2ASMN1; SMN2GAA | |
| SCHEMBL25803182 | 0.85 | SLC2A1 (0.44) | ALDH1A1LMNATSHRHTTMCOLN3 | |
| SCHEMBL25695018 | 0.84 | CLCN2 (0.32) | ALDH1A1LMNATSHRHTTMCOLN3 | |
| SCHEMBL25471110 | 0.83 | KDM4E (0.37) | ALDH1A1MEN1KMT2ASMN1; SMN2KDM4E | |
| SCHEMBL26833219 | 0.83 | HTT (0.34) | ALDH1A1LMNATSHRHTTMCOLN3 | |
| SCHEMBL25695019 | 0.82 | KDM4E (0.36) | ALDH1A1LMNATSHRHTTMCOLN3 | |
| SCHEMBL25689801 | 0.81 | IDO1 (0.47) | ALDH1A1LMNAHTTMAPTSMN1; SMN2 | |
| SCHEMBL27436564 | 0.81 | KDM4E (0.31) | ALDH1A1LMNATSHRHTTMCOLN3 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-4276533-A1 | CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION AND RESIST PATTERN FORMING PROCESS | Shin-Etsu Chemical Co., Ltd. (JP) | 2023-11-15 | — | — | EP | disclosed |
| EP-4276534-A1 | MASK BLANK, RESIST PATTERN FORMING PROCESS AND CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION | Shin-Etsu Chemical Co., Ltd. (JP) | 2023-11-15 | — | — | EP | disclosed |
| WO-2023189502-A1 | RADIATION-SENSITIVE COMPOSITION, PATTERN FORMATION METHOD, AND PHOTODEGRADABLE BASE | JSR株式会社 | 2023-10-05 | — | — | WO | disclosed |
| WO-2023120200-A1 | RADIATION-SENSITIVE COMPOSITION AND PATTERN FORMATION METHOD | JSR株式会社 | 2023-06-29 | — | — | WO | disclosed |
| WO-2023090129-A1 | RADIATION-SENSITIVE COMPOSITION AND METHOD FOR FORMING RESIST PATTERN | JSR株式会社 | 2023-05-25 | — | — | WO | disclosed |
| CN-102483574-A | Radiation-sensitive resin composition and compound | JSR CORP | 2012-05-30 | — | — | CN | disclosed |