SCHEMBL25710684

SCHEMBL25710684

OC(c1ccccc1)(c1cccc2ccccc12)c1cccc2ccccc12

nearest known ligand 0.65

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ HSD17B10 Q99714 4/20 0.65
▸ CYP2C19 P33261 3/20 0.65
▸ CYP1A2 P05177 3/20 0.65
▸ HPGD P15428 3/20 0.65
▸ CYP2D6 P10635 2/20 0.65
▸ CYP2C9 P11712 2/20 0.65
▸ HIF1A Q16665 1/20 0.65
▸ CFTR P13569 1/20 0.53
▸ GOPC Q9HD26 1/20 0.53
▸ KIF11 P52732 1/20 0.44
▸ ACP3 P15309 1/20 0.44
▸ TSHR P16473 3/20 0.42
▸ CYP3A4 P08684 3/20 0.42
▸ NR4A1 P22736 1/20 0.41
▸ NR4A2 P43354 1/20 0.41
▸ NR4A3 Q92570 1/20 0.41
▸ KDM4E B2RXH2 4/20 0.40
▸ MEN1 O00255 2/20 0.40
▸ KMT2A Q03164 2/20 0.40
▸ CRHBP P24387 1/20 0.40

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL2355481 0.96 CYP1A2 (0.59) HSD17B10CYP2C19CYP1A2HPGDCYP2D6
SCHEMBL29167170 0.87 CYP1A2 (0.48) HSD17B10CYP2C19CYP1A2HPGDCYP2D6
SCHEMBL13776777 0.81 CYP2C19 (0.53) HSD17B10CYP2C19CYP1A2HPGDCYP2D6
SCHEMBL9806370 0.80 CYP2C19 (0.56) HSD17B10CYP2C19CYP1A2HPGDCYP2D6
SCHEMBL19130800 0.80 CYP2C19 (0.56) HSD17B10CYP2C19CYP1A2HPGDCYP2D6
SCHEMBL21217954 0.80 CYP2D6 (0.44) HSD17B10CYP2C19CYP1A2HPGDCYP2D6
SCHEMBL13856943 0.79 HSD17B10 (1.00) HSD17B10CYP2C19CYP1A2HPGDCYP2D6
SCHEMBL28108200 0.78 ACP3 (0.46) HSD17B10CYP2C19CYP1A2HPGDCYP2D6
SCHEMBL5012463 0.78 ACP3 (0.46) HSD17B10CYP2C19CYP1A2HPGDCYP2D6
SCHEMBL1561798 0.78 CYP1A2 (0.48) HSD17B10CYP2C19CYP1A2HPGDCYP2D6

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20230203299-A1 RESIST UNDERLAYER FILM- FORMING COMPOSITION USING DIARYLMETHANE DERIVATIVE NISSAN CHEMICAL CORPORATION (JP) 2023-06-29 — — US disclosed
US-20230203299-A1 RESIST UNDERLAYER FILM- FORMING COMPOSITION USING DIARYLMETHANE DERIVATIVE NISSAN CHEMICAL CORPORATION (JP) 2023-06-29 — — US disclosed
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