Predicted protein targets (top 11)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CA1 | P00915 | 4/20 | 0.35 |
| ▸ | CA2 | P00918 | 4/20 | 0.35 |
| ▸ | CA7 | P43166 | 1/20 | 0.33 |
| ▸ | CA14 | Q9ULX7 | 1/20 | 0.33 |
| ▸ | LMNA | P02545 | 1/20 | 0.31 |
| ▸ | MEN1 | O00255 | 1/20 | 0.30 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.30 |
| ▸ | MAPT | P10636 | 1/20 | 0.30 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.30 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.30 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL25713582 | 0.92 | CA1 (0.35) | CA1CA2CA7CA14LMNA | |
| SCHEMBL24059213 | 0.81 | CA1 (0.35) | CA1CA2CA7CA14LMNA | |
| SCHEMBL25699476 | 0.77 | CA2 (0.44) | CA1CA2CA7CA14LMNA | |
| SCHEMBL25715313 | 0.77 | CA1 (0.35) | CA1CA2CA7CA14LMNA | |
| SCHEMBL25715538 | 0.77 | CA1 (0.35) | CA1CA2CA7CA14LMNA | |
| SCHEMBL23808377 | 0.75 | CA2 (0.44) | CA1CA2CA7CA14LMNA | |
| SCHEMBL25715305 | 0.72 | CA1 (0.35) | CA1CA2CA7CA14 | |
| SCHEMBL25467879 | 0.67 | CA2 (0.46) | CA1CA2CA7CA14LMNA | |
| SCHEMBL25713775 | 0.67 | — | — | |
| SCHEMBL25139368 | 0.65 | CA2 (0.46) | CA1CA2CA7CA14LMNA |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20230161249-A1 | ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE FILM, PATTERN FORMING METHOD, METHOD FOR MANUFACTURING ELECTRONIC DEVICE, AND COMPOUND | FUJIFILM CORPORATION (JP) | 2023-05-25 | — | — | US | disclosed |