Predicted protein targets (top 18)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | KDM4E | B2RXH2 | 12/20 | 0.46 |
| ▸ | ALDH1A1 | P00352 | 4/20 | 0.46 |
| ▸ | MEN1 | O00255 | 3/20 | 0.37 |
| ▸ | KMT2A | Q03164 | 3/20 | 0.37 |
| ▸ | HTT | P42858 | 1/20 | 0.37 |
| ▸ | TSHR | P16473 | 1/20 | 0.37 |
| ▸ | POLB | P06746 | 1/20 | 0.35 |
| ▸ | ALOX15 | P16050 | 1/20 | 0.35 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.32 |
| ▸ | MAPT | P10636 | 1/20 | 0.31 |
| ▸ | PKM | P14618 | 1/20 | 0.31 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.31 |
| ▸ | LMNA | P02545 | 1/20 | 0.31 |
| ▸ | CYP1A2 | P05177 | 1/20 | 0.30 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.30 |
| ▸ | CYP2D6 | P10635 | 1/20 | 0.30 |
| ▸ | CYP2C19 | P33261 | 1/20 | 0.30 |
| ▸ | ATM | Q13315 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL8402107 | 0.83 | KDM4E (0.40) | KDM4EALDH1A1MEN1KMT2AHTT | |
| SCHEMBL415514 | 0.82 | KDM4E (0.44) | KDM4EALDH1A1MEN1KMT2AHTT | |
| SCHEMBL19380644 | 0.81 | KDM4E (0.39) | KDM4EALDH1A1MEN1KMT2AHTT | |
| SCHEMBL123013 | 0.81 | KDM4E (0.39) | KDM4EALDH1A1MEN1KMT2AHTT | |
| SCHEMBL122796 | 0.81 | KDM4E (0.39) | KDM4EALDH1A1MEN1KMT2AHTT | |
| SCHEMBL1548023 | 0.81 | KDM4E (0.41) | KDM4EALDH1A1MEN1KMT2AHTT | |
| SCHEMBL12028597 | 0.80 | KDM4E (0.38) | KDM4EALDH1A1MEN1KMT2AHTT | |
| SCHEMBL4787657 | 0.79 | KDM4E (0.43) | KDM4EALDH1A1MEN1KMT2AHTT | |
| SCHEMBL10447558 | 0.79 | KDM4E (0.47) | KDM4EALDH1A1MEN1KMT2AHTT | |
| SCHEMBL24796703 | 0.78 | KDM4E (0.42) | KDM4EALDH1A1MEN1KMT2AHTT |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 110 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-114507251-B | Double-silicon-center chiral heteroaryl silane and preparation method thereof | 南方科技大学 | 2023-08-22 | — | — | CN | claimed |
| US-4080491-A | CATALYST CONTAINS ORGANOMETALLIC COMPOUND AND THE REACTION PRODUCT OF TUNGSTEN OR MOLYBDENUM OXIDE AND A PHOSPHOROUS HALIDE OR OXYHALIDE | SHOWA DENKO K.K. (JA) | 1978-03-21 | — | — | US | claimed |
| US-11886119-B2 | Material for forming underlayer film, resist underlayer film, method of producing resist underlayer film, and laminate | MITSUI CHEMICALS, INC. (JP) | 2024-01-30 | — | — | US | disclosed |
| CN-114507251-B | Double-silicon-center chiral heteroaryl silane and preparation method thereof | 南方科技大学 | 2023-08-22 | — | — | CN | disclosed |
| CN-113820920-B | Photosensitive resin composition, method for producing cured relief pattern, and semiconductor device | 旭化成株式会社 | 2023-07-04 | — | — | CN | disclosed |
| WO-2023112921-A1 | FLEXIBLE WAVEGUIDE | 三井化学株式会社 | 2023-06-22 | — | — | WO | disclosed |
| US-20230185195-A1 | MATERIAL FOR FORMING UNDERLAYER FILM, RESIST UNDERLAYER FILM, METHOD OF PRODUCING RESIST UNDERLAYER FILM, AND LAMINATE | MITSUI CHEMICALS, INC. (JP) | 2023-06-15 | — | — | US | disclosed |
| US-11599025-B2 | Resin material for forming underlayer film, resist underlayer film, method of producing resist underlayer film, and laminate | MITSUI CHEMICALS, INC. (JP) | 2023-03-07 | — | — | US | disclosed |
| CN-110088680-B | Double-layer photosensitive layer roll | 旭化成株式会社 | 2022-12-30 | — | — | CN | disclosed |
| CN-115185157-A | Photosensitive resin composition, method for producing cured relief pattern, and semiconductor device | 旭化成株式会社 | 2022-10-14 | — | — | CN | disclosed |
| CN-109313388-B | Negative photosensitive composition | 住友电木株式会社 | 2022-06-21 | — | — | CN | disclosed |
| US-7163982-B2 | Process for preparing fluorine-containing polymer and method of forming fine pattern using same | DAIKI INDUSTRIES, LTD. (JP) | 2007-01-16 | — | — | US | disclosed |
| US-6794459-B2 | PHOTOLITHOGRAPHY | SUMITOMO BAKELITE CO., LTD. (JP) | 2004-09-21 | — | — | US | disclosed |
| EP-1060206-B1 | MODIFIED POLYCYCLIC POLYMERS | SUMITOMO BAKELITE CO (JP) | 2004-04-14 | — | — | EP | disclosed |
| US-20030018153-A1 | Modified polycyclic polymers | THE B.F.GOODRICH COMPANY | 2003-01-23 | — | — | US | disclosed |
| US-6486263-B2 | INCREASING THE RATE OF REACTION OF THE HYDROGENATION STEP OF THE RING-OPENING METATHESIS POLYMERIZATION (ROMP) WITH CARBENE CONTAINING CATALYST BY ADDING A NON-INERT SOLVENT SUCH AS METHANOL; MULTIPLE CYCLES WITHOUT ADDITIONAL CATALYST | UNIVERSITY OF OTTAWA (CA) | 2002-11-26 | — | — | US | disclosed |
| US-6451945-B1 | CONTAINING PENDANT ACID LABILE FUNCTIONAL GROUP AND A FUNCTIONAL GROUP CONTAINING A METHYL CARBONYL OR SILYL PROTECTED HYDROXYL MOIETY | THE B.F. GOODRICH COMPANY | 2002-09-17 | — | — | US | disclosed |
| US-20020040109-A1 | Method for producing saturated polymers and saturated or unsaturated blends | OTTAWA, UNIVERSITY OF (CA) | 2002-04-04 | — | — | US | disclosed |
| EP-1060206-A1 | MODIFIED POLYCYCLIC POLYMERS | The B.F.Goodrich Co. (US) | 2000-12-20 | — | — | EP | disclosed |
| WO-1999042510-A1 | MODIFIED POLYCYCLIC POLYMERS | THE B.F. GOODRICH COMPANY (US) | 1999-08-26 | — | — | WO | disclosed |