Predicted protein targets (top 8)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CA14 | Q9ULX7 | 4/20 | 0.34 |
| ▸ | CA1 | P00915 | 3/20 | 0.34 |
| ▸ | CA12 | O43570 | 3/20 | 0.34 |
| ▸ | HDAC6 | Q9UBN7 | 2/20 | 0.34 |
| ▸ | CA7 | P43166 | 2/20 | 0.34 |
| ▸ | HDAC1 | Q13547 | 1/20 | 0.34 |
| ▸ | HDAC2 | Q92769 | 1/20 | 0.34 |
| ▸ | CA2 | P00918 | 2/20 | 0.33 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL28362744 | 0.85 | CHRM2 (0.35) | CA14CA1CA12HDAC6CA7 | |
| SCHEMBL1067066 | 0.82 | CA14 (0.38) | CA14CA1CA12HDAC6CA7 | |
| SCHEMBL3469119 | 0.82 | CA14 (0.46) | CA14CA1CA12HDAC6CA7 | |
| SCHEMBL1027531 | 0.81 | AAK1 (0.34) | CA14CA1CA12HDAC6CA7 | |
| SCHEMBL16196798 | 0.81 | CA14 (0.34) | CA14CA1CA12HDAC6CA7 | |
| SCHEMBL18400312 | 0.80 | CA14 (0.36) | CA14CA1CA12HDAC6CA7 | |
| SCHEMBL18619385 | 0.79 | CA14 (0.40) | CA14CA1CA12HDAC6CA7 | |
| SCHEMBL18285697 | 0.79 | CA14 (0.37) | CA14CA1CA12HDAC6CA7 | |
| SCHEMBL1859771 | 0.79 | CA14 (0.40) | CA14CA1CA12HDAC6CA7 | |
| SCHEMBL25123692 | 0.78 | HDAC6 (0.35) | CA14CA1CA12HDAC6CA7 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20230152698-A1 | POSITIVE RESIST COMPOSITION AND PATTERN FORMING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-05-18 | — | — | US | disclosed |
| US-20230152698-A1 | POSITIVE RESIST COMPOSITION AND PATTERN FORMING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-05-18 | — | — | US | disclosed |