Predicted protein targets (top 15)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | HDAC3 | O15379 | 1/20 | 0.53 |
| ▸ | HDAC1 | Q13547 | 1/20 | 0.53 |
| ▸ | HDAC2 | Q92769 | 1/20 | 0.53 |
| ▸ | NCOR2 | Q9Y618 | 1/20 | 0.53 |
| ▸ | CTSL | P07711 | 2/20 | 0.47 |
| ▸ | CTSB | P07858 | 2/20 | 0.47 |
| ▸ | CTSS | P25774 | 2/20 | 0.47 |
| ▸ | AKT1 | P31749 | 3/20 | 0.46 |
| ▸ | BACE1 | P56817 | 1/20 | 0.44 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.44 |
| ▸ | MEN1 | O00255 | 2/20 | 0.44 |
| ▸ | KMT2A | Q03164 | 2/20 | 0.44 |
| ▸ | LMNA | P02545 | 1/20 | 0.44 |
| ▸ | RECQL | P46063 | 1/20 | 0.43 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.42 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL3328177 | 0.87 | HDAC3 (0.54) | HDAC3HDAC1HDAC2NCOR2CTSL | |
| SCHEMBL2112935 | 0.87 | HDAC3 (0.54) | HDAC3HDAC1HDAC2NCOR2CTSL | |
| SCHEMBL9823156 | 0.87 | HDAC1 (0.54) | HDAC3HDAC1HDAC2NCOR2CTSL | |
| SCHEMBL9060170 | 0.87 | HDAC1 (0.60) | HDAC3HDAC1HDAC2NCOR2CTSL | |
| SCHEMBL4147838 | 0.85 | HDAC1 (0.56) | HDAC3HDAC1HDAC2NCOR2CTSL | |
| SCHEMBL8525848 | 0.85 | HDAC3 (0.56) | HDAC3HDAC1HDAC2NCOR2CTSL | |
| SCHEMBL1231760 | 0.85 | HDAC3 (0.53) | HDAC3HDAC1HDAC2NCOR2CTSL | |
| SCHEMBL8021840 | 0.84 | HDAC3 (0.55) | HDAC3HDAC1HDAC2NCOR2CTSL | |
| SCHEMBL4491888 | 0.84 | HDAC3 (0.52) | HDAC3HDAC1HDAC2NCOR2CTSL | |
| SCHEMBL1848202 | 0.84 | HDAC1 (0.52) | HDAC3HDAC1HDAC2NCOR2CTSL |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20230152698-A1 | POSITIVE RESIST COMPOSITION AND PATTERN FORMING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-05-18 | — | — | US | disclosed |
| US-20230152698-A1 | POSITIVE RESIST COMPOSITION AND PATTERN FORMING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-05-18 | — | — | US | disclosed |