SCHEMBL25736731

SCHEMBL25736731

CC(C)(C)OC(=O)NCCOC(=O)CS

nearest known ligand 0.49

Predicted protein targets (top 16)

geneUniProtsupporting neighboursconfidence
TDP1 Q9NUW8 1/20 0.49
IDO1 P14902 3/20 0.48
CA12 O43570 7/20 0.48
CA1 P00915 7/20 0.48
CA2 P00918 7/20 0.48
CA9 Q16790 7/20 0.48
MEN1 O00255 1/20 0.46
GAA P10253 1/20 0.46
KMT2A Q03164 1/20 0.46
MAOA P21397 1/20 0.43
MAOB P27338 1/20 0.43
EPHX1 P07099 1/20 0.41
MALT1 Q9UDY8 1/20 0.39
HTT P42858 1/20 0.38
TSHR P16473 1/20 0.38
HSD17B10 Q99714 1/20 0.38

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL25736736 0.91 TDP1 (0.44) TDP1IDO1CA12CA1CA2
SCHEMBL25736733 0.90 CA12 (0.56) TDP1IDO1CA12CA1CA2
SCHEMBL11888006 0.87 TDP1 (0.53) TDP1IDO1CA12CA1CA2
SCHEMBL25736734 0.87 CA12 (0.63) TDP1CA12CA1CA2CA9
SCHEMBL25736735 0.87 CA12 (0.63) TDP1CA12CA1CA2CA9
SCHEMBL25736704 0.87 TDP1 (0.46) TDP1IDO1CA12CA1CA2
SCHEMBL2152898 0.86 TDP1 (0.51) TDP1IDO1CA12CA1CA2
SCHEMBL2519901 0.84 IDO1 (0.52) TDP1IDO1CA12CA1CA2
SCHEMBL18354701 0.84 TDP1 (0.50) TDP1IDO1CA12CA1CA2
SCHEMBL7479664 0.83 TDP1 (0.49) TDP1IDO1CA12CA1CA2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20230152698-A1 POSITIVE RESIST COMPOSITION AND PATTERN FORMING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-05-18 US disclosed
US-20230152698-A1 POSITIVE RESIST COMPOSITION AND PATTERN FORMING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-05-18 US disclosed