Predicted protein targets (top 11)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CA12 | O43570 | 6/20 | 0.63 |
| ▸ | CA1 | P00915 | 6/20 | 0.63 |
| ▸ | CA2 | P00918 | 6/20 | 0.63 |
| ▸ | CA9 | Q16790 | 6/20 | 0.63 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.59 |
| ▸ | MAOA | P21397 | 1/20 | 0.52 |
| ▸ | MAOB | P27338 | 1/20 | 0.52 |
| ▸ | MEN1 | O00255 | 1/20 | 0.49 |
| ▸ | GAA | P10253 | 1/20 | 0.49 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.49 |
| ▸ | ACHE | P22303 | 10/20 | 0.46 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL25736734 | 1.00 | CA12 (0.63) | CA12CA1CA2CA9TDP1 | |
| SCHEMBL25736733 | 0.94 | CA12 (0.56) | CA12CA1CA2CA9TDP1 | |
| SCHEMBL4539930 | 0.89 | CA12 (0.68) | CA12CA1CA2CA9TDP1 | |
| SCHEMBL25736710 | 0.88 | CA12 (0.60) | CA12CA1CA2CA9TDP1 | |
| SCHEMBL25736709 | 0.88 | CA12 (0.60) | CA12CA1CA2CA9TDP1 | |
| SCHEMBL25736731 | 0.87 | TDP1 (0.49) | CA12CA1CA2CA9TDP1 | |
| SCHEMBL5190585 | 0.84 | CA12 (0.70) | CA12CA1CA2CA9TDP1 | |
| SCHEMBL5190573 | 0.83 | CA12 (0.68) | CA12CA1CA2CA9TDP1 | |
| SCHEMBL25736784 | 0.82 | TDP1 (0.56) | CA12CA1CA2CA9TDP1 | |
| SCHEMBL25736781 | 0.82 | TDP1 (0.56) | CA12CA1CA2CA9TDP1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20230152698-A1 | POSITIVE RESIST COMPOSITION AND PATTERN FORMING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-05-18 | — | — | US | disclosed |
| US-20230152698-A1 | POSITIVE RESIST COMPOSITION AND PATTERN FORMING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-05-18 | — | — | US | disclosed |