Predicted protein targets (top 8)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | TSHR | P16473 | 8/20 | 0.42 |
| ▸ | HPGD | P15428 | 1/20 | 0.32 |
| ▸ | ALDH1A1 | P00352 | 4/20 | 0.31 |
| ▸ | TP53 | P04637 | 2/20 | 0.31 |
| ▸ | HIF1A | Q16665 | 2/20 | 0.31 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.31 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.31 |
| ▸ | HCAR2 | Q8TDS4 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL8605586 | 0.80 | TSHR (0.46) | TSHRHPGDALDH1A1TP53HIF1A | |
| SCHEMBL9082756 | 0.78 | TSHR (0.40) | TSHRHPGDALDH1A1TP53HIF1A | |
| SCHEMBL587049 | 0.75 | TSHR (0.37) | TSHRHPGDALDH1A1TP53HIF1A | |
| SCHEMBL31252378 | 0.75 | TSHR (0.37) | TSHRHPGDALDH1A1TP53HIF1A | |
| SCHEMBL475926 | 0.73 | TSHR (0.45) | TSHRHPGDALDH1A1TP53HIF1A | |
| SCHEMBL27511672 | 0.72 | TSHR (0.38) | TSHRHPGDALDH1A1TP53HIF1A | |
| SCHEMBL27743559 | 0.72 | TSHR (0.34) | TSHR | |
| SCHEMBL2313926 | 0.72 | TSHR (0.43) | TSHRALDH1A1 | |
| SCHEMBL7036189 | 0.71 | TSHR (0.43) | TSHRHPGDALDH1A1TP53HIF1A | |
| SCHEMBL2744364 | 0.71 | TSHR (0.38) | TSHRHPGDALDH1A1TP53HIF1A |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 14 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-112266708-A | Developable anti-sand-blasting multifunctional protective material and preparation method and application thereof | 中科院广州化学有限公司 | 2021-01-26 | — | — | CN | claimed |
| CN-110461894-B | Curable composition, method for producing same, and article using same | 大金工业株式会社 | 2022-09-02 | — | — | CN | disclosed |
| CN-109476795-B | Curable composition, method for producing same, and article using same | 大金工业株式会社 | 2022-05-06 | — | — | CN | disclosed |
| CN-113956464-A | Compound having isocyanuric skeleton and composition comprising same | 大金工业株式会社 | 2022-01-21 | — | — | CN | disclosed |
| CN-109715702-B | Novel compound having isocyanuric skeleton and composition comprising same | 大金工业株式会社 | 2021-11-23 | — | — | CN | disclosed |
| CN-112266708-A | Developable anti-sand-blasting multifunctional protective material and preparation method and application thereof | 中科院广州化学有限公司 | 2021-01-26 | — | — | CN | disclosed |
| US-9946158-B2 | Composition for forming resist underlayer film for nanoimprint | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2018-04-17 | — | — | US | disclosed |
| EP-2461350-B1 | USE OF A COMPOSITION FOR FORMING RESIST UNDERLAYER FILM FOR NANOIMPRINT LITHOGRAPHY | NISSAN CHEMICAL IND LTD (JP) | 2018-02-28 | — | — | EP | disclosed |
| US-20150099070-A1 | COMPOSITION FOR FORMING RESIST UNDERLAYER FILM FOR NANOIMPRINT | NISSAN CHEMICAL IND LTD (JP) | 2015-04-09 | — | — | US | disclosed |
| EP-2461350-A1 | COMPOSITION FOR FORMING RESIST UNDERLAYER FILM FOR NANOIMPRINT LITHOGRAPHY | Nissan Chemical Industries, Ltd. (JP) | 2012-06-06 | — | — | EP | disclosed |
| US-20120128891-A1 | COMPOSITION FOR FORMING RESIST UNDERLAYER FILM FOR NANOIMPRINT | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2012-05-24 | — | — | US | disclosed |
| US-8048615-B2 | Silicon-containing resist underlayer coating forming composition for forming photo-crosslinking cured resist underlayer coating | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2011-11-01 | — | — | US | disclosed |
| US-20090162782-A1 | Silicon-Containing Resist Underlayer Coating Forming Composition for Forming Photo-Crosslinking Cured Resist Underlayer Coating | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2009-06-25 | — | — | US | disclosed |
| EP-1972998-A1 | SILICON-CONTAINING RESIST UNDERLYING LAYER FILM FORMING COMPOSITION FOR FORMATION OF PHOTOCROSSLINKING CURED RESIST UNDERLYING LAYER FILM | Nissan Chemical Industries, Ltd. (JP) | 2008-09-24 | — | — | EP | disclosed |