Predicted protein targets (top 13)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CYP19A1 | P11511 | 1/20 | 0.37 |
| ▸ | KDM4E | B2RXH2 | 2/20 | 0.32 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.32 |
| ▸ | HPGD | P15428 | 2/20 | 0.32 |
| ▸ | GLA | P06280 | 1/20 | 0.32 |
| ▸ | MAPT | P10636 | 2/20 | 0.32 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.32 |
| ▸ | THRB | P10828 | 1/20 | 0.31 |
| ▸ | RAB9A | P51151 | 1/20 | 0.31 |
| ▸ | LMNA | P02545 | 2/20 | 0.31 |
| ▸ | GAA | P10253 | 3/20 | 0.31 |
| ▸ | CASP1 | P29466 | 1/20 | 0.30 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL25818005 | 0.87 | MEN1 (0.32) | MAPTL3MBTL1LMNAGAA | |
| SCHEMBL25818003 | 0.81 | CYP17A1 (0.40) | CYP19A1MAPTL3MBTL1RAB9ALMNA | |
| SCHEMBL27259451 | 0.77 | MEN1 (0.49) | CYP19A1ALDH1A1MAPTL3MBTL1RAB9A | |
| SCHEMBL25818154 | 0.76 | CYP19A1 (0.44) | CYP19A1KDM4EALDH1A1HPGDGLA | |
| SCHEMBL12997503 | 0.74 | CYP19A1 (0.44) | CYP19A1KDM4EALDH1A1HPGDMAPT | |
| SCHEMBL12997497 | 0.74 | CYP19A1 (0.46) | CYP19A1KDM4EALDH1A1HPGDGLA | |
| SCHEMBL12997501 | 0.73 | CYP19A1 (0.42) | CYP19A1ALDH1A1MAPTL3MBTL1RAB9A | |
| SCHEMBL25689780 | 0.73 | CYP19A1 (0.42) | CYP19A1ALDH1A1MAPTL3MBTL1RAB9A | |
| SCHEMBL12997495 | 0.72 | CYP19A1 (0.44) | CYP19A1KDM4EALDH1A1HPGDGLA | |
| Hydrochloric Acid SCHEMBL31564947 | 0.72 | CYP19A1 (0.44) | CYP19A1ALDH1A1MAPTL3MBTL1RAB9A |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-11703756-B2 | Resist composition and method of forming resist pattern | TOKYO OHKA KOGYO CO., LTD. (JP) | 2023-07-18 | — | — | US | disclosed |