Predicted protein targets (top 12)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CYP17A1 | P05093 | 2/20 | 0.40 |
| ▸ | CYP19A1 | P11511 | 2/20 | 0.40 |
| ▸ | EPHX2 | P34913 | 1/20 | 0.32 |
| ▸ | ALOX5AP | P20292 | 1/20 | 0.32 |
| ▸ | MEN1 | O00255 | 1/20 | 0.31 |
| ▸ | RAB9A | P51151 | 1/20 | 0.31 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.31 |
| ▸ | LMNA | P02545 | 1/20 | 0.31 |
| ▸ | GAA | P10253 | 1/20 | 0.31 |
| ▸ | HSD11B1 | P28845 | 2/20 | 0.30 |
| ▸ | MAPT | P10636 | 1/20 | 0.30 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL25818006 | 0.81 | CYP19A1 (0.37) | CYP19A1RAB9ALMNAGAAMAPT | |
| SCHEMBL13418069 | 0.79 | CYP17A1 (0.52) | CYP17A1CYP19A1MEN1RAB9AKMT2A | |
| SCHEMBL26079234 | 0.79 | CYP17A1 (0.41) | CYP17A1CYP19A1EPHX2ALOX5APMEN1 | |
| SCHEMBL16406651 | 0.78 | LMNA (0.50) | CYP17A1CYP19A1EPHX2MEN1RAB9A | |
| SCHEMBL25818005 | 0.78 | MEN1 (0.32) | MEN1KMT2ALMNAGAAMAPT | |
| SCHEMBL26079235 | 0.78 | CYP17A1 (0.39) | CYP17A1CYP19A1EPHX2ALOX5APMEN1 | |
| SCHEMBL26079237 | 0.77 | CYP17A1 (0.39) | CYP17A1CYP19A1EPHX2ALOX5APMEN1 | |
| SCHEMBL26079563 | 0.77 | CYP17A1 (0.41) | CYP17A1CYP19A1EPHX2ALOX5APMEN1 | |
| SCHEMBL26079251 | 0.77 | CYP17A1 (0.39) | CYP17A1CYP19A1EPHX2ALOX5APMEN1 | |
| SCHEMBL25818120 | 0.77 | CYP17A1 (0.43) | CYP17A1CYP19A1EPHX2ALOX5APMEN1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-11703756-B2 | Resist composition and method of forming resist pattern | TOKYO OHKA KOGYO CO., LTD. (JP) | 2023-07-18 | — | — | US | disclosed |