SCHEMBL25823453

SCHEMBL25823453

CCCCC(CC)CSc1cc2c3c(cccc3c1)C(=O)N(OS(=O)(=O)CC13CC[C@H](CC1=O)C3(C)C)C2=O

nearest known ligand 0.39

Predicted protein targets (top 17)

geneUniProtsupporting neighboursconfidence
MEN1 O00255 4/20 0.37
KMT2A Q03164 4/20 0.37
SMN1; SMN2 Q16637 3/20 0.36
CYP1A2 P05177 2/20 0.36
CYP2C19 P33261 2/20 0.36
CA1 P00915 2/20 0.36
CA2 P00918 2/20 0.36
CA5A P35218 2/20 0.36
CA5B Q9Y2D0 2/20 0.36
ALDH1A1 P00352 2/20 0.36
TSHR P16473 1/20 0.36
HSD17B10 Q99714 1/20 0.36
CXCR3 P49682 2/20 0.35
TDP1 Q9NUW8 1/20 0.35
CYP2D6 P10635 1/20 0.34
CYP2C9 P11712 1/20 0.34
L3MBTL1 Q9Y468 1/20 0.34

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL13829261 1.00 MEN1 (0.37) MEN1KMT2ASMN1; SMN2CYP1A2CYP2C19
SCHEMBL24025853 0.92 MEN1 (0.38) MEN1KMT2ASMN1; SMN2CYP1A2CYP2C19
SCHEMBL13829134 0.88 KMT2A (0.40) MEN1KMT2ASMN1; SMN2CYP1A2CYP2C19
SCHEMBL13829344 0.87 CXCR3 (0.38) MEN1KMT2ASMN1; SMN2CYP1A2CYP2C19
SCHEMBL15617810 0.87 MEN1 (0.37) MEN1KMT2ASMN1; SMN2CYP1A2CYP2C19
SCHEMBL13829109 0.83 KMT2A (0.41) MEN1KMT2ASMN1; SMN2CYP1A2CYP2C19
SCHEMBL13829092 0.83 MEN1 (0.36) MEN1KMT2ASMN1; SMN2CYP1A2CYP2C19
SCHEMBL19985741 0.83 SMN1; SMN2 (0.42) MEN1KMT2ASMN1; SMN2CYP1A2CYP2C19
SCHEMBL13829352 0.83 MEN1 (0.38) MEN1KMT2ASMN1; SMN2CYP1A2CYP2C19
SCHEMBL13829350 0.82 KMT2A (0.39) MEN1KMT2ASMN1; SMN2CYP1A2CYP2C19

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20230229084-A1 CHEMICALLY AMPLIFIED PHOTOSENSITIVE COMPOSITION, PHOTOSENSITIVE DRY FILM, PRODUCTION METHOD OF SUBSTRATE HAVING TEMPLATE FOR PLATING, AND PRODUCTION METHOD OF PLATED ARTICLE TOKYO OHKA KOGYO CO., LTD. (JP) 2023-07-20 US disclosed