SCHEMBL25836653

SCHEMBL25836653

CC(F)CCC12CC3CC(CC(C3)C1)C2

nearest known ligand 0.46

Predicted protein targets (top 17)

geneUniProtsupporting neighboursconfidence
GRIN2D O15399 4/20 0.46
GRIN3B O60391 4/20 0.46
GRIN1 Q05586 4/20 0.46
GRIN2A Q12879 4/20 0.46
GRIN2B Q13224 4/20 0.46
GRIN2C Q14957 4/20 0.46
GRIN3A Q8TCU5 4/20 0.46
KMT2A Q03164 4/20 0.39
EPHX2 P34913 3/20 0.37
MEN1 O00255 3/20 0.37
SLC22A2 O15244 1/20 0.37
SLC47A1 Q96FL8 1/20 0.37
ATM Q13315 1/20 0.36
ALDH1A1 P00352 1/20 0.36
PKM P14618 1/20 0.36
SMN1; SMN2 Q16637 1/20 0.36
MAPT P10636 1/20 0.35

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL1524675 0.78 GRIN2D (0.46) GRIN2DGRIN3BGRIN1GRIN2AGRIN2B
SCHEMBL659230 0.74 GRIN2D (0.57) GRIN2DGRIN3BGRIN1GRIN2AGRIN2B
SCHEMBL28136761 0.73 GRIN2D (0.50) GRIN2DGRIN3BGRIN1GRIN2AGRIN2B
SCHEMBL11697939 0.72 GRIN2D (0.68) GRIN2DGRIN3BGRIN1GRIN2AGRIN2B
SCHEMBL19509239 0.72 KMT2A (0.44) GRIN2DGRIN3BGRIN1GRIN2AGRIN2B
SCHEMBL15648853 0.72 SMN1; SMN2 (0.50) GRIN2DGRIN3BGRIN1GRIN2AGRIN2B
SCHEMBL16590966 0.72 GRIN2D (0.41) GRIN2DGRIN3BGRIN1GRIN2AGRIN2B
SCHEMBL16147061 0.72 SMN1; SMN2 (0.50) GRIN2DGRIN3BGRIN1GRIN2AGRIN2B
SCHEMBL21396819 0.72 EPHX2 (0.42) GRIN2DGRIN3BGRIN1GRIN2AGRIN2B
SCHEMBL23206979 0.70 EPHX2 (0.40) GRIN2DGRIN3BGRIN1GRIN2AGRIN2B

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-12032290-B2 Actinic ray-sensitive or radiation-sensitive resin composition, resist film, pattern forming method, and method for manufacturing electronic device FUJIFILM CORPORATION (JP) 2024-07-09 US disclosed
US-11703758-B2 Photosensitive composition for EUV light, pattern forming method, and method for manufacturing electronic device FUJIFILM CORPORATION (JP) 2023-07-18 US disclosed