SCHEMBL25844734

SCHEMBL25844734

CC(C)C(C)(I)C(=O)OC(CS(=O)(=O)O)C(F)(F)F

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL25844719 0.86 — —
SCHEMBL25844666 0.86 — —
SCHEMBL25844721 0.82 — —
SCHEMBL2608648 0.82 PRKCA (0.36) —
SCHEMBL25844661 0.82 — —
SCHEMBL25844933 0.82 — —
SCHEMBL25844691 0.80 — —
SCHEMBL25844860 0.80 — —
SCHEMBL25844718 0.80 — —
SCHEMBL25844919 0.80 — —

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11709426-B2 Resist composition and pattern forming process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-07-25 — — US disclosed
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