Predicted protein targets (top 15)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ESR1 | P03372 | 2/20 | 0.37 |
| ▸ | ESR2 | Q92731 | 2/20 | 0.37 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.34 |
| ▸ | KMT2A | Q03164 | 3/20 | 0.33 |
| ▸ | MEN1 | O00255 | 2/20 | 0.33 |
| ▸ | CASP3 | P42574 | 1/20 | 0.33 |
| ▸ | SENP8 | Q96LD8 | 1/20 | 0.33 |
| ▸ | SENP7 | Q9BQF6 | 1/20 | 0.33 |
| ▸ | SENP6 | Q9GZR1 | 1/20 | 0.33 |
| ▸ | DDR1 | Q08345 | 2/20 | 0.33 |
| ▸ | SERPINE1 | P05121 | 1/20 | 0.33 |
| ▸ | KAT6A | Q92794 | 5/20 | 0.32 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.32 |
| ▸ | CETP | P11597 | 1/20 | 0.32 |
| ▸ | HDAC8 | Q9BY41 | 1/20 | 0.32 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL25845026 | 0.90 | ESR1 (0.38) | ESR1ESR2KDM4EKMT2AMEN1 | |
| SCHEMBL26313010 | 0.88 | ESR1 (0.36) | ESR1ESR2KDM4EKMT2AMEN1 | |
| SCHEMBL26312797 | 0.85 | ELANE (0.38) | ESR1ESR2KDM4EKMT2AMEN1 | |
| SCHEMBL23426243 | 0.83 | KAT6A (0.34) | ESR1ESR2KDM4EKMT2AMEN1 | |
| SCHEMBL19755961 | 0.79 | KAT6A (0.35) | KMT2AMEN1KAT6AMAPK1 | |
| SCHEMBL18775853 | 0.78 | PARP1 (0.40) | KDM4EKMT2A | |
| SCHEMBL18775881 | 0.78 | KMT2A (0.44) | ESR1ESR2KDM4EKMT2AMEN1 | |
| SCHEMBL25845200 | 0.78 | ELANE (0.33) | — | |
| SCHEMBL18775731 | 0.77 | MAPK1 (0.40) | KDM4EKMT2AMEN1DDR1MAPK1 | |
| SCHEMBL25527731 | 0.77 | KMT2A (0.34) | KDM4EKMT2AMEN1MAPK1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-11709426-B2 | Resist composition and pattern forming process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-07-25 | — | — | US | disclosed |