Predicted protein targets (top 18)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ESR1 | P03372 | 2/20 | 0.36 |
| ▸ | ESR2 | Q92731 | 2/20 | 0.36 |
| ▸ | DDR1 | Q08345 | 2/20 | 0.34 |
| ▸ | KAT6A | Q92794 | 4/20 | 0.34 |
| ▸ | NPC1 | O15118 | 1/20 | 0.33 |
| ▸ | POLB | P06746 | 1/20 | 0.33 |
| ▸ | CYP2C9 | P11712 | 1/20 | 0.33 |
| ▸ | RAB9A | P51151 | 1/20 | 0.33 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.33 |
| ▸ | MEN1 | O00255 | 1/20 | 0.33 |
| ▸ | CASP3 | P42574 | 1/20 | 0.33 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.33 |
| ▸ | SENP8 | Q96LD8 | 1/20 | 0.33 |
| ▸ | SENP7 | Q9BQF6 | 1/20 | 0.33 |
| ▸ | SENP6 | Q9GZR1 | 1/20 | 0.33 |
| ▸ | SERPINE1 | P05121 | 1/20 | 0.32 |
| ▸ | ELANE | P08246 | 1/20 | 0.32 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.32 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL25845026 | 0.89 | ESR1 (0.38) | ESR1ESR2DDR1KAT6AKDM4E | |
| SCHEMBL25844826 | 0.88 | ESR1 (0.37) | ESR1ESR2DDR1KAT6AKDM4E | |
| SCHEMBL26938191 | 0.85 | ESR1 (0.36) | ESR1ESR2DDR1KAT6ANPC1 | |
| SCHEMBL15216266 | 0.84 | ESR1 (0.37) | ESR1ESR2DDR1KAT6ANPC1 | |
| SCHEMBL26312797 | 0.82 | ELANE (0.38) | ESR1ESR2DDR1KAT6AKDM4E | |
| SCHEMBL23426243 | 0.82 | KAT6A (0.34) | ESR1ESR2KAT6AKDM4EMEN1 | |
| SCHEMBL25476726 | 0.82 | TSHR (0.30) | — | |
| SCHEMBL26313009 | 0.79 | GABRA1 (0.34) | — | |
| SCHEMBL18775731 | 0.79 | MAPK1 (0.40) | DDR1NPC1RAB9AKDM4EMEN1 | |
| SCHEMBL18775853 | 0.77 | PARP1 (0.40) | RAB9AKDM4EKMT2A |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20230296981-A1 | RESIST MATERIAL AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-09-21 | — | — | US | disclosed |
| US-20230296980-A1 | RESIST MATERIAL AND PATTERN FORMING METHOD | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-09-21 | — | — | US | disclosed |
| US-20230273519-A1 | RADIATION-SENSITIVE RESIN COMPOSITION AND PATTERN FORMATION METHOD | JSR CORPORATION (JP) | 2023-08-31 | — | — | US | disclosed |