SCHEMBL2585357

SCHEMBL2585357

C=CC(=O)OC12CC3CC(CC(OCOC4CCCCC4)(C3)C1)C2

nearest known ligand 0.32

Predicted protein targets (top 3)

geneUniProtsupporting neighboursconfidence
DPP4 P27487 1/20 0.32
EPHX2 P34913 2/20 0.32
L3MBTL1 Q9Y468 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL4124355 0.84
SCHEMBL2578049 0.81 DPP4 (0.32) DPP4EPHX2
SCHEMBL822780 0.81 ALDH1A1 (0.36)
SCHEMBL12170586 0.80 MEN1 (0.33)
SCHEMBL12153604 0.79 GAA (0.33)
SCHEMBL13998864 0.79 MEN1 (0.33)
SCHEMBL12190112 0.78 EPHX2 (0.35) DPP4EPHX2
SCHEMBL3451429 0.78 TSHR (0.39)
SCHEMBL10259462 0.77 DPP4 (0.32) DPP4
SCHEMBL4860186 0.76 MEN1 (0.31)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8048612-B2 Polymer and chemically amplified resist composition comprising the same SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2011-11-01 US disclosed
US-8030419-B2 Process for producing polymer for semiconductor lithography MARUZEN PETROCHEMICAL CO., LTD. (JP) 2011-10-04 US disclosed
US-8030419-B2 Process for producing polymer for semiconductor lithography MARUZEN PETROCHEMICAL CO., LTD. (JP) 2011-10-04 US disclosed
US-20100048848-A1 PROCESS FOR PRODUCING POLYMER FOR SEMICONDUCTOR LITHOGRAPHY MARUZEN PETROCHEMICAL CO., LTD. (JP) 2010-02-25 US disclosed
US-20100048848-A1 PROCESS FOR PRODUCING POLYMER FOR SEMICONDUCTOR LITHOGRAPHY MARUZEN PETROCHEMICAL CO., LTD. (JP) 2010-02-25 US disclosed
US-20090317744-A1 POLYMER AND CHEMICALLY AMPLIFIED RESIST COMPOSITION COMPRISING THE SAME SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2009-12-24 US disclosed