SCHEMBL25868775

SCHEMBL25868775

CCC(C)c1ccc(C(=O)OC)cc1C(=O)OC

nearest known ligand 0.55

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
KDM4E B2RXH2 12/20 0.55
ALDH1A1 P00352 9/20 0.55
LMNA P02545 3/20 0.55
KMT2A Q03164 2/20 0.52
HSD17B10 Q99714 5/20 0.49
MAPT P10636 4/20 0.49
HPGD P15428 4/20 0.49
GLA P06280 2/20 0.49
GAA P10253 2/20 0.49
CASP1 P29466 1/20 0.49
CASP7 P55210 1/20 0.49
ATM Q13315 1/20 0.49
STAT3 P40763 1/20 0.46
CA12 O43570 1/20 0.45
CA1 P00915 1/20 0.45
CA2 P00918 1/20 0.45
CA7 P43166 1/20 0.45
XDH P47989 1/20 0.45
CA9 Q16790 1/20 0.45
CA14 Q9ULX7 1/20 0.45

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL13898615 0.84 CA12 (0.57) KDM4EALDH1A1LMNAKMT2AHSD17B10
SCHEMBL22838421 0.83 MAPT (0.53) KDM4EALDH1A1LMNAKMT2AHSD17B10
SCHEMBL10368652 0.83 CA12 (0.59) KDM4EALDH1A1LMNAKMT2AHSD17B10
SCHEMBL27664817 0.81 KDM4E (0.51) KDM4EALDH1A1LMNAKMT2AHSD17B10
SCHEMBL8816549 0.80 SMN1; SMN2 (0.50) KDM4EALDH1A1LMNAKMT2AHSD17B10
SCHEMBL1786603 0.79 TSHR (0.52) KDM4EALDH1A1LMNAKMT2AHSD17B10
SCHEMBL27334383 0.79 KDM4E (0.43) KDM4EALDH1A1LMNAKMT2AHSD17B10
SCHEMBL19647651 0.77 KDM4E (0.44) KDM4EALDH1A1LMNAKMT2AHSD17B10
SCHEMBL23898836 0.76 PPARA (0.36) KDM4EALDH1A1LMNAKMT2AMAPT
SCHEMBL1353342 0.76 ACE2 (0.54) KDM4EALDH1A1KMT2AMAPTSMN1; SMN2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20230341780-A1 PHOTORESIST COMPOSITION AND METHOD OF MANUFACTURING A SEMICONDUCTOR DEVICE TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. (TW) 2023-10-26 US disclosed
US-20230341780-A1 PHOTORESIST COMPOSITION AND METHOD OF MANUFACTURING A SEMICONDUCTOR DEVICE TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. (TW) 2023-10-26 US disclosed
US-11703765-B2 Photoresist composition and method of manufacturing a semiconductor device TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD. (TW) 2023-07-18 US disclosed