SCHEMBL25876124

SCHEMBL25876124

C=C(C)C(=O)Oc1cccc(I)c1

nearest known ligand 0.53

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ELANE P08246 1/20 0.53
CYP3A4 P08684 1/20 0.43
LMNA P02545 1/20 0.43
KMT2A Q03164 4/20 0.42
ATM Q13315 1/20 0.42
MEN1 O00255 2/20 0.40
ACHE P22303 2/20 0.40
CES2 O00748 1/20 0.37
CES1 P23141 1/20 0.37
ESR1 P03372 1/20 0.36
ESR2 Q92731 1/20 0.36
TDP1 Q9NUW8 1/20 0.36
CYP1A2 P05177 1/20 0.36
MTOR P42345 1/20 0.35
NPC1 O15118 1/20 0.35
ALDH1A1 P00352 1/20 0.35
TP53 P04637 1/20 0.35
HTT P42858 1/20 0.35
RAB9A P51151 1/20 0.35
SMN1; SMN2 Q16637 1/20 0.35

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL218655 0.87 ELANE (0.56) ELANECYP3A4LMNAKMT2AATM
SCHEMBL379060 0.82 ELANE (0.51) ELANECYP3A4LMNAKMT2AATM
SCHEMBL14173262 0.82 ELANE (0.51) ELANECYP3A4LMNAKMT2AATM
SCHEMBL26846471 0.82 LMNA (0.59) ELANECYP3A4LMNAKMT2AATM
SCHEMBL1513774 0.82 LMNA (0.63) ELANECYP3A4LMNAKMT2AMEN1
SCHEMBL346386 0.81 ELANE (0.59) ELANELMNAKMT2ACES2CES1
SCHEMBL1347701 0.81 LMNA (0.68) ELANECYP3A4LMNAKMT2AATM
SCHEMBL31097939 0.81 CYP3A4 (0.68) ELANECYP3A4LMNAKMT2AATM
SCHEMBL30048439 0.81 LMNA (0.68) ELANECYP3A4LMNAKMT2AATM
SCHEMBL1756084 0.81 CYP3A4 (0.50) ELANECYP3A4LMNAKMT2AATM

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20230205082-A9 RADIATION-SENSITIVE COMPOSITION AND RESIST PATTERN-FORMING METHOD JSR CORPORATION (JP) 2023-06-29 US disclosed
US-20230205082-A9 RADIATION-SENSITIVE COMPOSITION AND RESIST PATTERN-FORMING METHOD JSR CORPORATION (JP) 2023-06-29 US disclosed