SCHEMBL258874

SCHEMBL258874

CN(C)C([SiH3])N(C)C

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL2270781 0.70
SCHEMBL2101333 0.67
Hydrochloric Acid SCHEMBL28751231 0.67
SCHEMBL5350181 0.61
Trimethylammonium SCHEMBL28022142 0.60
SCHEMBL12236592 0.60
SCHEMBL2563574 0.60
SCHEMBL7162516 0.57 KDM4E (0.32)
SCHEMBL10589687 0.56
SCHEMBL20586 0.56

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1140 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20260136856-A1 METHOD AND SYSTEM FOR FORMING SILICON NITRIDE ON A SIDEWALL OF A FEATURE ASM IP HOLDING BV (NL) 2026-05-14 US claimed
US-20260123302-A1 METHOD AND APPARATUS FOR DEPOSITING A CARBON-CONTAINING MATERIAL ASM IP HOLDING BV (NL) 2026-04-30 US claimed
US-12550644-B2 Method and system for forming silicon nitride on a sidewall of a feature ASM IP HOLDING B.V. (NL) 2026-02-10 US claimed
US-12518966-B2 Selective plasma enhanced atomic layer deposition VERSUM MATERIALS US, LLC (US) 2026-01-06 US claimed
US-12435416-B2 Compositions and methods using same for non-conformal deposition of silicon containing films VERSUM MATERIALS US, LLC (US) 2025-10-07 US claimed
US-12421603-B2 Composition for high temperature atomic layer deposition of high quality silicon oxide thin films VERSUM MATERIALS US, LLC (US) 2025-09-23 US claimed
US-20250270698-A1 BORON-CONTAINING PRECURSORS FOR THE ALD DEPOSITION OF BORON NITRIDE FILMS VERSUM MATERIALS US, LLC 2025-08-28 US claimed
US-20250160174-A1 DISPLAY DEVICE AND METHOD OF FABRICATION FOR THE SAME SAMSUNG DISPLAY CO., LTD. (KR) 2025-05-15 US claimed
EP-4493734-A1 BORON-CONTAINING PRECURSORS FOR THE ALD DEPOSITION OF BORON NITRIDE FILMS Versum Materials US, LLC (US) 2025-01-22 EP claimed
US-20240092954-A1 POLYMER THIN FILM FOR CAPTURING AND RELEASING NUCLEIC ACID WITH HIGH EFFICIENCY AND METHOD FOR EXTRACTING NUCLEIC ACID USING THE SAME KOREA ADVANCED INSTITUTE OF SCIENCE AND TECHNOLOGY (KR) 2024-03-21 US claimed
EP-0594175-A1 Process for producing aromatic polycarbonate MITSUBISHI CHEMICAL CORPORATION (JP) 1994-04-27 EP claimed
EP-0586860-A2 Photoresist composition and process for forming a pattern using the same SAMSUNG ELECTRONICS CO., LTD. (KR) 1994-03-16 EP claimed
EP-0540084-A1 Method for passivating the inner surface of a reactor subject to coking, by deposition of a ceramic coating, and method of pyrolyzing hydrocarbons ENICHEM S.p.A. (IT) 1993-05-05 EP claimed
US-5208069-A Silane precursor ISTITUTO GUIDO DONEGANI S.P.A. (IT) 1993-05-04 US claimed
US-4931351-A Bilayer lithographic process EASTMAN KODAK COMPANY (US) 1990-06-05 US claimed
US-4912242-A Process for preparing silicon esters DOW CORNING CORPORATION (US) 1990-03-27 US claimed
EP-0274757-A2 Bilayer lithographic process EASTMAN KODAK COMPANY (a New Jersey corporation) (US) 1988-07-20 EP claimed
US-4412874-A Silane ballistic modifier containing propellant THE UNITED STATES OF AMERICA AS REPRESENTED BY THE SECRETARY OF THE ARMY (US) 1983-11-01 US claimed
US-4304805-A Sealing leaks by polymerization of volatilized aminosilane monomers Packo, Joseph J. (US) 1981-12-08 US claimed
US-4237172-A Sealing leaks by polymerization of volatilized aminosilane monomers Packo, Joseph J. (US) 1980-12-02 US claimed