⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL23504929 | 0.87 | — | — | |
| SCHEMBL22201020 | 0.81 | — | — | |
| SCHEMBL13929703 | 0.81 | — | — | |
| SCHEMBL19850946 | 0.81 | — | — | |
| SCHEMBL14890698 | 0.77 | — | — | |
| SCHEMBL13515813 | 0.76 | — | — | |
| SCHEMBL13701177 | 0.74 | — | — | |
| SCHEMBL3750371 | 0.71 | — | — | |
| SCHEMBL22114924 | 0.71 | — | — | |
| SCHEMBL12783141 | 0.71 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 14 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| WO-2024127977-A1 | RESIST COMPOSITION, RESIST PATTERN FORMATION METHOD, COMPOUND, AND ACID DIFFUSION CONTROL AGENT | 東京応化工業株式会社 | 2024-06-20 | — | — | WO | disclosed |
| WO-2024122425-A1 | RESIST COMPOSITION, RESIST PATTERN FORMATION METHOD, COMPOUND, AND ACID DIFFUSION CONTROL AGENT | 東京応化工業株式会社 | 2024-06-13 | — | — | WO | disclosed |
| WO-2024043121-A1 | RESIST COMPOSITION, RESIST PATTERN FORMATION METHOD, AND COMPOUND AND INTERMEDIATE THEREFOR | 東京応化工業株式会社 | 2024-02-29 | — | — | WO | disclosed |
| WO-2024043098-A1 | RESIST COMPOSITION, RESIST PATTERN FORMING METHOD, COMPOUND, AND INTERMEDIATE THEREOF | 東京応化工業株式会社 | 2024-02-29 | — | — | WO | disclosed |
| WO-2023223865-A1 | RESIST COMPOSITION, RESIST PATTERN FORMATION METHOD, COMPOUND, AND ACID DIFFUSION CONTROL AGENT | 東京応化工業株式会社 | 2023-11-23 | — | — | WO | disclosed |
| WO-2023223897-A1 | RESIST COMPOSITION, RESIST PATTERN FORMATION METHOD, AND COMPOUND | 東京応化工業株式会社 | 2023-11-23 | — | — | WO | disclosed |
| WO-2023195407-A1 | RESIST COMPOSITION AND METHOD FOR FORMING RESIST PATTERN | 東京応化工業株式会社 | 2023-10-12 | — | — | WO | disclosed |
| WO-2023189961-A1 | RESIST COMPOSITION AND METHOD FOR FORMING RESIST PATTERN | 東京応化工業株式会社 | 2023-10-05 | — | — | WO | disclosed |
| WO-2023171743-A1 | RESIST COMPOSITION, METHOD FOR FORMING RESIST PATTERN, COMPOUND, AND POLYMER | 東京応化工業株式会社 | 2023-09-14 | — | — | WO | disclosed |
| WO-2023162907-A1 | RESIST COMPOSITION, RESIST PATTERN FORMATION METHOD, COMPOUND, AND ACID GENERATION AGENT | 東京応化工業株式会社 | 2023-08-31 | — | — | WO | disclosed |
| WO-2023163008-A1 | RESIST COMPOSITION, RESIST PATTERN FORMATION METHOD, COMPOUND, AND POLYMER COMPOUND | 東京応化工業株式会社 | 2023-08-31 | — | — | WO | disclosed |
| WO-2023140231-A1 | RESIST COMPOSITION, METHOD FOR FORMING RESIST PATTERN, AND COMPOUND | 東京応化工業株式会社 | 2023-07-27 | — | — | WO | disclosed |
| WO-2023140364-A1 | RESIST COMPOSITION, METHOD FOR FORMING RESIST PATTERN, COMPOUND, AND POLYMER | 東京応化工業株式会社 | 2023-07-27 | — | — | WO | disclosed |
| WO-2023068251-A1 | RESIST COMPOSITION, RESIST PATTERN FORMATION METHOD, COMPOUND, AND ACID DIFFUSION CONTROL AGENT | 東京応化工業株式会社 | 2023-04-27 | — | — | WO | disclosed |