⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL13651376 | 0.89 | NLRP3 (0.36) | — | |
| SCHEMBL13701177 | 0.84 | — | — | |
| SCHEMBL19996940 | 0.83 | — | — | |
| SCHEMBL12014819 | 0.82 | — | — | |
| SCHEMBL13588094 | 0.82 | — | — | |
| SCHEMBL12783214 | 0.82 | TGM2 (0.30) | — | |
| SCHEMBL685765 | 0.82 | — | — | |
| SCHEMBL14189321 | 0.81 | — | — | |
| SCHEMBL14924192 | 0.81 | — | — | |
| SCHEMBL17146551 | 0.81 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 8 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-9046773-B2 | Actinic ray-sensitive or radiation-sensitive resin composition, pattern forming method using the same, polymerizable compound and polymer compound obtained by polymerizing the polymerizable compound | FUJIFILM CORPORATION (JP) | 2015-06-02 | — | — | US | disclosed |
| US-9046773-B2 | Actinic ray-sensitive or radiation-sensitive resin composition, pattern forming method using the same, polymerizable compound and polymer compound obtained by polymerizing the polymerizable compound | FUJIFILM CORPORATION (JP) | 2015-06-02 | — | — | US | disclosed |
| US-8637623-B2 | Monomer having electron-withdrawing substituent and lactone skeleton, polymeric compound, and photoresist composition | DAICEL CHEMICAL INDUSTRIES, LTD. (JP) | 2014-01-28 | — | — | US | disclosed |
| US-8637623-B2 | Monomer having electron-withdrawing substituent and lactone skeleton, polymeric compound, and photoresist composition | DAICEL CHEMICAL INDUSTRIES, LTD. (JP) | 2014-01-28 | — | — | US | disclosed |
| US-8637623-B2 | Monomer having electron-withdrawing substituent and lactone skeleton, polymeric compound, and photoresist composition | DAICEL CHEMICAL INDUSTRIES, LTD. (JP) | 2014-01-28 | — | — | US | disclosed |
| US-20100297555-A1 | MONOMER HAVING ELECTRON-WITHDRAWING SUBSTITUENT AND LACTONE SKELETON, POLYMERIC COMPOUND, AND PHOTORESIST COMPOSITION | DAICEL CHEMICAL INDUSTRIES, LTD. (JP) | 2010-11-25 | — | — | US | disclosed |
| US-20100297555-A1 | MONOMER HAVING ELECTRON-WITHDRAWING SUBSTITUENT AND LACTONE SKELETON, POLYMERIC COMPOUND, AND PHOTORESIST COMPOSITION | DAICEL CHEMICAL INDUSTRIES, LTD. (JP) | 2010-11-25 | — | — | US | disclosed |
| US-20090246695-A1 | ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, PATTERN FORMING METHOD USING THE SAME, POLYMERIZABLE COMPOUND AND POLYMER COMPOUND OBTAINED BY POLYMERIZING THE POLYMERIZABLE COMPOUND | FUJIFILM CORPORATION (JP) | 2009-10-01 | — | — | US | disclosed |