SCHEMBL25899810

SCHEMBL25899810

C=Cc1cc(OC(C)OCCOC)cc(C(=O)OC(C)(C)C)c1

nearest known ligand 0.31

Predicted protein targets (top 4)

geneUniProtsupporting neighboursconfidence
▸ GCK P35557 3/20 0.31
▸ TAS1R3 Q7RTX0 1/20 0.31
▸ TAS1R1 Q7RTX1 1/20 0.31
▸ SLC7A5 Q01650 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL25900757 0.78 — —
SCHEMBL25900768 0.76 — —
SCHEMBL28886336 0.75 CA12 (0.38) SLC7A5
SCHEMBL23812276 0.74 LMNA (0.41) SLC7A5
SCHEMBL25899816 0.72 CA12 (0.43) SLC7A5
SCHEMBL31646897 0.69 STAT3 (0.34) SLC7A5
4-Vinylphenol SCHEMBL6906320 0.69 ESR1 (0.38) TAS1R3TAS1R1
SCHEMBL2996714 0.67 NOTUM (0.43) —
SCHEMBL29130080 0.65 CA1 (0.37) —
SCHEMBL20864985 0.65 SERPINE1 (0.32) SLC7A5

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
WO-2023140364-A1 RESIST COMPOSITION, METHOD FOR FORMING RESIST PATTERN, COMPOUND, AND POLYMER 東京応化工業株式会社 2023-07-27 — — WO disclosed
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