SCHEMBL2592840

SCHEMBL2592840

CCCC(I)C(=O)OC

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL2859567 0.87 SMN1; SMN2 (0.42)
SCHEMBL3813450 0.86 CA2 (0.59)
SCHEMBL10796927 0.85 ZDHHC7 (0.58)
SCHEMBL2865718 0.83 ZDHHC7 (0.45)
SCHEMBL29190379 0.83 TDP1 (0.39)
SCHEMBL6760312 0.83 CA1 (0.43)
SCHEMBL3813654 0.83 ZDHHC7 (0.61)
SCHEMBL27962365 0.83 ZDHHC7 (0.61)
SCHEMBL27962387 0.83 ZDHHC7 (0.61)
SCHEMBL27962345 0.83 ZDHHC7 (0.61)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 32 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-103910738-A Bisbenzylisoquinoline quaternary ammonium salt as well as preparation method and application thereof in preparing antitumor drug UNIV SHANDONG NORMAL 2014-07-09 CN claimed
CN-103910741-A Bisbenzylisoquinoline betaine as well as preparation method thereof and application thereof in preparation of anti-tumor medicament UNIV SHANDONG NORMAL 2014-07-09 CN claimed
US-11958802-B2 Migration-resistant photopolymerization sensitizer KAWASAKI KASEI CHEMICALS LTD. (JP) 2024-04-16 US disclosed
CN-117412997-A Water-absorbent resin composition, and absorbent article using same 三大雅株式会社 2024-01-16 CN disclosed
CN-113166036-B Photopolymerizing sensitizers with migration resistance 川崎化成工业株式会社 2023-10-10 CN disclosed
WO-2023188633-A1 WATER-ABSORBABLE RESIN COMPOSITION, ABSORBER AND ABSORBENT ARTICLE EACH USING SAME, AND METHOD FOR PRODUCING WATER-ABSORBABLE RESIN COMPOSITION SDPグローバル株式会社 2023-10-05 WO disclosed
WO-2023188719-A1 WATER-ABSORBING RESIN COMPOSITION, ABSORBER AND ABSORBENT ARTICLE OBTAINED USING SAME, AND METHOD FOR PRODUCING WATER-ABSORBING RESIN COMPOSITION SDPグローバル株式会社 2023-10-05 WO disclosed
WO-2023188712-A1 METHOD FOR PRODUCING WATER-ABSORBING RESIN COMPOSITION, WATER-ABSORBING RESIN COMPOSITION, ABSORBING BODY USING SAME, AND ABSORBENT ARTICLE SDPグローバル株式会社 2023-10-05 WO disclosed
US-20220106254-A1 MIGRATION-RESISTANT PHOTOPOLYMERIZATION SENSITIZER KAWASAKI KASEI CHEMICALS LTD. (JP) 2022-04-07 US disclosed
US-11084889-B2 Water-absorbent resin particles and method for producing same SDP GLOBAL CO., LTD. (JP) 2021-08-10 US disclosed
CN-113166036-A Photopolymerisable sensitizers having migration resistance 川崎化成工业株式会社 2021-07-23 CN disclosed
CN-103910741-A Bisbenzylisoquinoline betaine as well as preparation method thereof and application thereof in preparation of anti-tumor medicament UNIV SHANDONG NORMAL 2014-07-09 CN disclosed
US-8772323-B2 Benzoxazole- and tetrahydrobenzoxazole-substituted pyridazinones as GPR119 agonists BOEHRINGER INGELHEIM INTERNATIONAL GMBH (DE) 2014-07-08 US disclosed
US-20130172323-A1 PYRIDAZINONES AS GPR119 AGONISTS BOEHRINGER INGELHEIM INTERNATIONAL GMBH (DE) 2013-07-04 US disclosed
EP-2566864-A2 PYRIDAZINONES AS GPR119 AGONISTS Boehringer Ingelheim International GmbH (DE) 2013-03-13 EP disclosed
WO-2011138427-A2 PYRIDAZINONES AS GPR119 AGONISTS BOEHRINGER INGELHEIM INTERNATIONAL GMBH (DE) 2011-11-10 WO disclosed
EP-0773930-B1 AROMATIC AMINO ETHERS AS PAIN RELIEVING AGENTS ZENECA LTD (GB) 2000-10-11 EP disclosed
US-5843942-A Aromatic amino ethers as pain relieving agents ZENECA LIMITED (GB) 1998-12-01 US disclosed
EP-0773930-A1 AROMATIC AMINO ETHERS AS PAIN RELIEVING AGENTS ZENECA LIMITED (GB) 1997-05-21 EP disclosed
WO-1996003380-A1 AROMATIC AMINO ETHERS AS PAIN RELIEVING AGENTS ZENECA LIMITED (GB) 1996-02-08 WO disclosed