Predicted protein targets (top 14)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | HPGD | P15428 | 1/20 | 0.55 |
| ▸ | RECQL | P46063 | 1/20 | 0.52 |
| ▸ | EPHX1 | P07099 | 1/20 | 0.49 |
| ▸ | USP2 | O75604 | 1/20 | 0.47 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.47 |
| ▸ | GPR119 | Q8TDV5 | 8/20 | 0.46 |
| ▸ | PRMT5 | O14744 | 1/20 | 0.46 |
| ▸ | WDR77 | Q9BQA1 | 1/20 | 0.46 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.45 |
| ▸ | MAPT | P10636 | 1/20 | 0.45 |
| ▸ | THRB | P10828 | 1/20 | 0.45 |
| ▸ | PTPN2 | P17706 | 1/20 | 0.45 |
| ▸ | PTPN1 | P18031 | 1/20 | 0.45 |
| ▸ | PTPN6 | P29350 | 1/20 | 0.45 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL25960300 | 0.86 | HPGD (0.41) | HPGDRECQLEPHX1GPR119PRMT5 | |
| SCHEMBL25960265 | 0.86 | HPGD (0.48) | HPGDRECQLEPHX1USP2SMN1; SMN2 | |
| SCHEMBL5313683 | 0.85 | HPGD (0.53) | HPGDRECQLEPHX1USP2SMN1; SMN2 | |
| SCHEMBL15727504 | 0.84 | HPGD (0.51) | HPGDRECQLEPHX1USP2SMN1; SMN2 | |
| SCHEMBL13174456 | 0.83 | HPGD (0.50) | HPGDRECQLEPHX1USP2SMN1; SMN2 | |
| SCHEMBL1576027 | 0.83 | HPGD (0.50) | HPGDRECQLEPHX1USP2SMN1; SMN2 | |
| SCHEMBL610184 | 0.83 | HPGD (0.50) | HPGDRECQLEPHX1USP2SMN1; SMN2 | |
| SCHEMBL6052611 | 0.83 | HPGD (0.50) | HPGDRECQLEPHX1USP2SMN1; SMN2 | |
| SCHEMBL3658834 | 0.83 | HPGD (0.50) | HPGDRECQLEPHX1USP2SMN1; SMN2 | |
| SCHEMBL4097772 | 0.83 | GPR119 (0.60) | HPGDRECQLEPHX1USP2SMN1; SMN2 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20230244149-A1 | COMPOSITION FOR FORMING SILICON-CONTAINING RESIST UNDERLAYER FILM AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-08-03 | — | — | US | disclosed |