SCHEMBL25960264

SCHEMBL25960264

CC(C)(C)OC(=O)N1CCCC1CCC[SiH3]

nearest known ligand 0.46

Predicted protein targets (top 16)

geneUniProtsupporting neighboursconfidence
ATM Q13315 2/20 0.44
HSD17B10 Q99714 1/20 0.44
SMN1; SMN2 Q16637 1/20 0.42
ALDH1A1 P00352 2/20 0.41
MEN1 O00255 1/20 0.41
KMT2A Q03164 1/20 0.41
L3MBTL1 Q9Y468 1/20 0.41
PDE8B O95263 1/20 0.40
OPRD1 P41143 1/20 0.39
NPC1 O15118 1/20 0.39
CHEK2 O96017 1/20 0.39
TSHR P16473 1/20 0.38
FPR3 P25089 1/20 0.38
FPR2 P25090 1/20 0.38
LMNA P02545 1/20 0.38
NPSR1 Q6W5P4 1/20 0.38

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL25960302 0.89 ATM (0.38) ATMHSD17B10SMN1; SMN2ALDH1A1MEN1
SCHEMBL6337962 0.87 HSD17B10 (0.45) ATMHSD17B10SMN1; SMN2ALDH1A1MEN1
SCHEMBL6337359 0.87 HSD17B10 (0.45) ATMHSD17B10SMN1; SMN2ALDH1A1MEN1
SCHEMBL18849728 0.87 ATM (0.50) ATMHSD17B10SMN1; SMN2ALDH1A1MEN1
SCHEMBL6337357 0.87 HSD17B10 (0.45) ATMHSD17B10SMN1; SMN2ALDH1A1MEN1
SCHEMBL25960267 0.86 HSD17B10 (0.42) ATMHSD17B10SMN1; SMN2ALDH1A1MEN1
SCHEMBL6345733 0.86 ATM (0.44) ATMHSD17B10SMN1; SMN2ALDH1A1MEN1
SCHEMBL3815408 0.86 ATM (0.44) ATMHSD17B10SMN1; SMN2ALDH1A1MEN1
SCHEMBL32687105 0.86 ATM (0.44) ATMHSD17B10SMN1; SMN2ALDH1A1MEN1
SCHEMBL6338610 0.84 ATM (0.43) ATMHSD17B10SMN1; SMN2ALDH1A1MEN1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20230244149-A1 COMPOSITION FOR FORMING SILICON-CONTAINING RESIST UNDERLAYER FILM AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-08-03 US disclosed