SCHEMBL25960302

SCHEMBL25960302

CCC(C)(C)OC(=O)N1CCCC1CCC[SiH3]

nearest known ligand 0.38

Predicted protein targets (top 12)

geneUniProtsupporting neighboursconfidence
ATM Q13315 2/20 0.38
FKBP1A P62942 3/20 0.35
ALDH1A1 P00352 2/20 0.35
L3MBTL1 Q9Y468 2/20 0.35
MEN1 O00255 1/20 0.35
KMT2A Q03164 1/20 0.35
HSD17B10 Q99714 1/20 0.34
POLB P06746 1/20 0.34
SMN1; SMN2 Q16637 1/20 0.33
CHEK2 O96017 1/20 0.33
OPRD1 P41143 1/20 0.32
PDE8B O95263 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL25960264 0.89 ATM (0.44) ATMALDH1A1L3MBTL1MEN1KMT2A
SCHEMBL25960304 0.88 ALOX5AP (0.35) ATMFKBP1AALDH1A1L3MBTL1MEN1
SCHEMBL1849871 0.83 POLB (0.53) ATMFKBP1AALDH1A1L3MBTL1MEN1
SCHEMBL1850667 0.83 POLB (0.53) ATMFKBP1AALDH1A1L3MBTL1MEN1
SCHEMBL1849869 0.83 POLB (0.53) ATMFKBP1AALDH1A1L3MBTL1MEN1
SCHEMBL25960303 0.83 ATM (0.35) ATMFKBP1AALDH1A1L3MBTL1MEN1
SCHEMBL24251932 0.81 DPP4 (0.39) ATMFKBP1AALDH1A1L3MBTL1HSD17B10
SCHEMBL25960309 0.80 FKBP1A (0.52) FKBP1A
SCHEMBL18849728 0.79 ATM (0.50) ATMALDH1A1L3MBTL1MEN1KMT2A
SCHEMBL15326146 0.78 PDE8B (0.40) ATMFKBP1AALDH1A1HSD17B10PDE8B

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20230244149-A1 COMPOSITION FOR FORMING SILICON-CONTAINING RESIST UNDERLAYER FILM AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-08-03 US disclosed