⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL26538475 | 0.91 | — | — | |
| SCHEMBL98786 | 0.91 | — | — | |
| SCHEMBL14870867 | 0.82 | — | — | |
| SCHEMBL15891257 | 0.82 | — | — | |
| SCHEMBL12602385 | 0.82 | — | — | |
| SCHEMBL14870866 | 0.82 | — | — | |
| SCHEMBL16743505 | 0.81 | — | — | |
| SCHEMBL12602337 | 0.81 | ALDH1A1 (0.32) | — | |
| SCHEMBL6350343 | 0.80 | — | — | |
| SCHEMBL25526811 | 0.80 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20230259029-A1 | ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, PATTERN FORMING METHOD, AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE | FUJIFILM CORPORATION (JP) | 2023-08-17 | — | — | US | disclosed |