SCHEMBL25970902

SCHEMBL25970902

Cc1ccc(C2(c3cccc(Cl)c3)c3ccccc3-c3ccccc32)cc1Cl

nearest known ligand 0.51

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ESR1 P03372 1/20 0.51
ESR2 Q92731 1/20 0.51
MAPT P10636 3/20 0.40
LMNA P02545 3/20 0.40
MEN1 O00255 2/20 0.40
KMT2A Q03164 2/20 0.40
SMN1; SMN2 Q16637 2/20 0.40
KDM4E B2RXH2 1/20 0.40
OPRK1 P41145 1/20 0.40
NPSR1 Q6W5P4 1/20 0.35
PDK2 Q15119 3/20 0.35
PGR P06401 1/20 0.35
POLB P06746 1/20 0.33
TDP1 Q9NUW8 1/20 0.33
L3MBTL1 Q9Y468 1/20 0.33
PLA2G7 Q13093 1/20 0.33
CHRM5 P08912 2/20 0.33
GHSR Q92847 1/20 0.33
DHFR P00374 1/20 0.33
TYMS P04818 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL20763932 0.91 ESR1 (0.60) ESR1ESR2MAPTLMNAMEN1
SCHEMBL3957889 0.86 ESR1 (0.47) ESR1ESR2MAPTLMNAMEN1
SCHEMBL24156030 0.82 MEN1 (0.48) ESR1ESR2MAPTLMNAMEN1
SCHEMBL20340482 0.82 ESR1 (0.51) ESR1ESR2MAPTLMNAMEN1
SCHEMBL30234081 0.80 ESR1 (0.41) ESR1ESR2MAPTLMNAMEN1
SCHEMBL20690877 0.80 ESR1 (0.41) ESR1ESR2MAPTLMNAMEN1
SCHEMBL6562683 0.78 ESR1 (0.65) ESR1ESR2MAPTLMNAMEN1
SCHEMBL8984548 0.77 ESR1 (0.73) ESR1ESR2MAPTLMNAMEN1
SCHEMBL30446197 0.77 ESR1 (0.73) ESR1ESR2MAPTLMNAMEN1
SCHEMBL21497285 0.77 ESR1 (0.46) ESR1ESR2MAPTLMNAMEN1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20230260787-A1 COMPOSITION FOR FORMING PROTECTIVE FILM AGAINST ALKALINE AQUEOUS HYDROGEN PEROXIDE, SUBSTRATE FOR PRODUCING SEMICONDUCTOR APPARATUS, METHOD FOR FORMING PROTECTIVE FILM, AND METHOD FOR FORMING PATTERN SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-08-17 US disclosed