SCHEMBL26014123

SCHEMBL26014123

C#CCOC(=C)/C=C\C(=C/C)C1(/C(C)=C/C=C(\C=C)OCC#C)c2ccccc2-c2ccccc21

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL20739486 0.80 ALDH1A1 (0.32) —
SCHEMBL25706919 0.80 — —
SCHEMBL23127842 0.76 — —
SCHEMBL25141740 0.76 — —
SCHEMBL24805905 0.75 — —
SCHEMBL22820150 0.74 — —
SCHEMBL23517527 0.71 ALDH1A1 (0.37) —
SCHEMBL22820193 0.71 MAOB (0.33) —
SCHEMBL16311698 0.69 — —
SCHEMBL22820323 0.64 NPC1 (0.34) —

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20230259031-A1 RESIST UNDERLAYER FILM-FORMING COMPOSITION NISSAN CHEMICAL CORPORATION (JP) 2023-08-17 — — US disclosed
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