Predicted protein targets (top 10)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | AR | P10275 | 1/20 | 0.31 |
| ▸ | HPGD | P15428 | 2/20 | 0.30 |
| ▸ | PKM | P14618 | 1/20 | 0.30 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.30 |
| ▸ | MMP2 | P08253 | 1/20 | 0.30 |
| ▸ | MMP9 | P14780 | 1/20 | 0.30 |
| ▸ | MMP12 | P39900 | 1/20 | 0.30 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.30 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.30 |
| ▸ | MAPT | P10636 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL26052215 | 0.86 | HPGD (0.30) | HPGDPKMSMN1; SMN2MMP2MMP9 | |
| SCHEMBL25803370 | 0.84 | HPGD (0.35) | ARHPGDPKMSMN1; SMN2KDM4E | |
| SCHEMBL26248493 | 0.81 | MAPT (0.38) | HPGDPKMSMN1; SMN2KDM4EALDH1A1 | |
| SCHEMBL26526731 | 0.80 | TP53 (0.32) | MAPT | |
| SCHEMBL26248538 | 0.77 | NR1H2 (0.37) | HPGDPKMSMN1; SMN2KDM4EALDH1A1 | |
| SCHEMBL15418919 | 0.75 | AR (0.43) | ARMMP2MMP9MMP12KDM4E | |
| SCHEMBL26248535 | 0.74 | SLC6A4 (0.43) | ARSMN1; SMN2KDM4EALDH1A1MAPT | |
| Ethane SCHEMBL28136904 | 0.73 | AR (0.42) | ARMMP2MMP9MMP12KDM4E | |
| SCHEMBL19328193 | 0.71 | HTR7 (0.37) | ARHPGDPKMSMN1; SMN2MMP2 | |
| SCHEMBL27278535 | 0.70 | CYP1A2 (0.40) | HPGDSMN1; SMN2KDM4EALDH1A1MAPT |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| WO-2023157801-A1 | PHOTOSENSITIVE RESIN COMPOSITION, METHOD FOR PRODUCING RESIST PATTERN FILM, AND METHOD FOR PRODUCING PLATED SHAPED ARTICLE | JSR株式会社 | 2023-08-24 | — | — | WO | disclosed |