Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | PRKCE | Q02156 | 3/20 | 0.45 |
| ▸ | ALOX15 | P16050 | 3/20 | 0.42 |
| ▸ | MAPK1 | P28482 | 2/20 | 0.42 |
| ▸ | HTT | P42858 | 2/20 | 0.42 |
| ▸ | ALDH1A1 | P00352 | 3/20 | 0.40 |
| ▸ | MEN1 | O00255 | 3/20 | 0.40 |
| ▸ | KMT2A | Q03164 | 3/20 | 0.40 |
| ▸ | TDP1 | Q9NUW8 | 3/20 | 0.40 |
| ▸ | MYLK | Q15746 | 2/20 | 0.40 |
| ▸ | RECQL | P46063 | 2/20 | 0.40 |
| ▸ | MAPT | P10636 | 2/20 | 0.40 |
| ▸ | PRKCG | P05129 | 1/20 | 0.40 |
| ▸ | PRKCA | P17252 | 1/20 | 0.40 |
| ▸ | APEX1 | P27695 | 1/20 | 0.40 |
| ▸ | CYP3A4 | P08684 | 2/20 | 0.35 |
| ▸ | HPGD | P15428 | 2/20 | 0.35 |
| ▸ | ALOX12 | P18054 | 2/20 | 0.33 |
| ▸ | TSHR | P16473 | 1/20 | 0.33 |
| ▸ | CASP1 | P29466 | 1/20 | 0.33 |
| ▸ | HIF1A | Q16665 | 1/20 | 0.33 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL14081748 | 0.96 | PRKCE (0.42) | PRKCEALOX15MAPK1HTTALDH1A1 | |
| SCHEMBL14028983 | 0.95 | PRKCE (0.44) | PRKCEALOX15MAPK1HTTALDH1A1 | |
| SCHEMBL12432071 | 0.93 | PRKCE (0.49) | PRKCEALOX15MAPK1HTTALDH1A1 | |
| SCHEMBL14015321 | 0.90 | PRKCE (0.47) | PRKCEALOX15MAPK1HTTALDH1A1 | |
| SCHEMBL2605569 | 0.90 | PRKCE (0.38) | PRKCEALOX15MAPK1HTTALDH1A1 | |
| SCHEMBL2605568 | 0.90 | PRKCE (0.44) | PRKCEALOX15MAPK1HTTALDH1A1 | |
| SCHEMBL13884103 | 0.88 | PRKCE (0.39) | PRKCEALOX15MAPK1HTTALDH1A1 | |
| SCHEMBL14081758 | 0.88 | PRKCE (0.39) | PRKCEALOX15MAPK1HTTALDH1A1 | |
| SCHEMBL14081747 | 0.88 | PRKCE (0.45) | PRKCEALOX15MAPK1HTTALDH1A1 | |
| SCHEMBL13410390 | 0.88 | PRKCE (0.40) | PRKCEALOX15MAPK1HTTALDH1A1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 12 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8173349-B2 | Photosensitive resin composition, polymer compound, method of forming a pattern, and electronic device | FUJIFILM CORPORATION (JP) | 2012-05-08 | — | — | US | disclosed |
| US-8158324-B2 | Positive-type photosensitive resin composition | TORAY INDUSTRIES, INC. (JP) | 2012-04-17 | — | — | US | disclosed |
| US-7977028-B2 | Photosensitive resin composition and adhesion promoter | TORAY INDUSTRIES, INC. (JP) | 2011-07-12 | — | — | US | disclosed |
| US-20100099041-A1 | POSITIVE-TYPE PHOTOSENSITIVE RESIN COMPOSITION | TORAY INDUSTRIES, INC. (JP) | 2010-04-22 | — | — | US | disclosed |
| US-20100080963-A1 | PHOTOSENSITIVE RESIN COMPOSITION, POLYMER COMPOUND, METHOD OF FORMING A PATTERN, AND ELECTRONIC DEVICE | FUJIFILM CORPORATION (JP) | 2010-04-01 | — | — | US | disclosed |
| US-7615324-B2 | Photosensitive composition, and cured relief pattern production method and semiconductor device using the same | FUJIFILM CORPORATION (JP) | 2009-11-10 | — | — | US | disclosed |
| US-7598009-B2 | Photosensitive resin composition, production method for cured relief pattern using it, and semiconductor device | FUJIFILM CORPORATION (JP) | 2009-10-06 | — | — | US | disclosed |
| US-20090123867-A1 | PHOTOSENSITIVE RESIN COMPOSITION AND ADHESION PROMOTER | TORAY INDUSTRIES, INC. (JP) | 2009-05-14 | — | — | US | disclosed |
| US-7507518-B2 | Photosensitive resin precursor composition | TORAY INDUSTRIES, INC. (JP) | 2009-03-24 | — | — | US | disclosed |
| US-20090035693-A1 | PHOTOSENSITIVE RESIN COMPOSITION, PRODUCTION METHOD FOR CURED RELIEF PATTERN USING IT, AND SEMICONDUCTOR DEVICE | FUJIFILM CORPORATION (JP) | 2009-02-05 | — | — | US | disclosed |
| US-20080227024-A1 | PHOTOSENSITIVE COMPOSITION, AND CURED RELIEF PATTERN PRODUCTION METHOD AND SEMICONDUCTOR DEVICE USING THE SAME | FUJIFILM CORPORATION (JP) | 2008-09-18 | — | — | US | disclosed |
| US-7416821-B2 | Thermally cured undercoat for lithographic application | FUJIFILM ELECTRONIC MATERIALS, U.S.A., INC. (US) | 2008-08-26 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20090123867-A1 | PHOTOSENSITIVE RESIN COMPOSITION AND ADHESION PROMOTER | PCNA, TERB1, SMC2 | PRKCE 3494/4885ALOX15 919/4885MAPK1 3313/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.